- Samsung Display Co., Ltd. v. Pictiva Displays International Ltd.All claims unpatentablePTAB · Jul 22, 2026 · IPR2024-01095 · APJ Garth D Baer · IPR · Remand
On remand, the Board maintained its finding that claims 2 and 17 are unpatentable under §103 over Diekmann and Ma, and Suzuki and Ma.
RulingsRemand decision- RemandDecided for petitioner
“that is both n-doped and comprised of 8-hydroxy-quinolinolato-lithium (Liq). The district-court defendant’s first invalidity challenge relied primarily on Clix2, which lacked an n-doped ETL. Paper 48, 2, Paper 50, 3. Thus, the asserted combination required modifying Clix2’s non-doped ETL by adding an n-dopant. Clix2’s missing n-doped ETL appeared to be a focus at trial. See Ex. 2034, 917:1–18, 920:8–14. Here, in contrast, Petitioner proposed a more modest modification to materially different primary references, Suzuki and Diekmann, which both already have n-doped ETLs. See Paper 50, 2–3; Paper 54 8–9. As we explained in our Final Written Decision, because Patent Owner did not contest that Liq acts as an n-dopant in Ma, Petitioner’s combinations were obvious because they merely “substitute one known n-dopant for another to further the same goal of improving ETL conductivity.” Paper 54, 12. That simple-substitution analysis would not be the same when n-doping Clix2’s non-doped ETL. For this reason, we agree with Petitioner that the district-court Clix2-based combination “is a different combination with a materially different motivation-to-combine analysis,” as compared to the Diekmann/Suzuki and Ma combinations that are at issue here. Paper 50, 3.” slip op. at 2
- Obviousness (§103) › Motivation to combine / reasonable expectation of successUnpatentableMotivation foundUnpatentable
“Dependent claims 2 and 17 require an electron transport layer (ETL) that is both n-doped and comprised of 8-hydroxy-quinolinolato-lithium (Liq). The district-court defendant’s first invalidity challenge relied primarily on Clix2, which lacked an n-doped ETL. Paper 48, 2, Paper 50, 3. Thus, the asserted combination required modifying Clix2’s non-doped ETL by adding an n-dopant. Clix2’s missing n-doped ETL appeared to be a focus at trial. See Ex. 2034, 917:1–18, 920:8–14. Here, in contrast, Petitioner proposed a more modest modification to materially different primary references, Suzuki and Diekmann, which both already have n-doped ETLs. See Paper 50, 2–3; Paper 54 8–9. As we explained in our Final Written Decision, because Patent Owner did not contest that Liq acts as an n-dopant in Ma, Petitioner’s combinations were obvious because they merely “substitute one known n-dopant for another to further the same goal of improving ETL conductivity.” Paper 54, 12. That simple-substitution analysis would not be the same when n-doping Clix2’s non-doped ETL. For this reason, we agree with Petitioner that the district-court Clix2-based combination “is a different combination with a materially different motivation-to-combine analysis,” as compared to the Diekmann/Suzuki and Ma combinations that are at issue here. Paper 50, 3.” slip op. at 2
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“that is both n-doped and comprised of 8-hydroxy-quinolinolato-lithium (Liq). The district-court defendant’s first invalidity challenge relied primarily on Clix2, which lacked an n-doped ETL. Paper 48, 2, Paper 50, 3. Thus, the asserted combination required modifying Clix2’s non-doped ETL by adding an n-dopant. Clix2’s missing n-doped ETL appeared to be a focus at trial. See Ex. 2034, 917:1–18, 920:8–14. Here, in contrast, Petitioner proposed a more modest modification to materially different primary references, Suzuki and Diekmann, which both already have n-doped ETLs. See Paper 50, 2–3; Paper 54 8–9. As we explained in our Final Written Decision, because Patent Owner did not contest that Liq acts as an n-dopant in Ma, Petitioner’s combinations were obvious because they merely “substitute one known n-dopant for another to further the same goal of improving ETL conductivity.” Paper 54, 12. That simple-substitution analysis would not be the same when n-doping Clix2’s non-doped ETL. For this reason, we agree with Petitioner that the district-court Clix2-based combination “is a different combination with a materially different motivation-to-combine analysis,” as compared to the Diekmann/Suzuki and Ma combinations that are at issue here. Paper 50, 3.” slip op. at 2
Patent outcomesUS 11,828,425 unpatentable§ 103 obviousnessPatents in suitUS 11,828,425 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jul 20, 2026 · IPR2025-00228 · APJ Michael T Cygan · IPR · Final written decision
Claims 1–18 are unpatentable: claims 1, 2, 4, 5, and 9–18 as obvious over Kim; claims 1–18 over Kim and Fang; claims 1–15 over Han and Fang; and claims 17–18 over Han, Fang, and Chen.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 26 (citing Ex. 1003 ¶42). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, how it is manufactured, and its component parts.” Id. Patent Owner does not dispute this assessment. PO Resp. 7–8. For purposes of this Decision, we adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’276 patent and the prior art of record.” slip op. at 6
- Expert testimonyPatent owner expert creditedDecided for patent owner
“Dr. Campbell has a Ph.D. in physics, supplying the advanced degree that Petitioner’s definition of a person having ordinary skill in the art accepts as a replacement for some experience. Ex. 2006 ¶ 2. Dr. Campbell has significant experience in semiconductor technology, including in process technologies for submicron CMOS, years of research in semiconductor processing, materials, and device structures, and authored “[t]he leading textbook on semiconductor technology.” Id. ¶¶ 2–4. Dr. Campbell qualifies as a person of ordinary skill in the art under the parties’ agreed definition.” slip op. at 7
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“Patent Owner proposed that the terms “exposing portions” and “etching the exposed portions” require two different steps performed in that order. PO Resp. 7–10. Petitioner does not contest this characterization. Pet. Reply 1– 2. Patent Owner also proposes that this requires the exposure step not to perform any etching of the newly exposed layer. PO Resp. 10–12 (citing Ex. 1001, 10:2–5, 10:15–17 (stating that the etch-stop layer “protects the underlying structure until all the VIA openings 640 are formed” and that it “[t]he essence of an etch-stop layer dictates that contact-hole etching stops or slows down upon contact, i.e., exposing without penetrating it.” Pet. Reply 11. Based on the record before us, we determine that no claim term requires express construction for purposes of this Decision.” slip op. at 7
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundReasonable expectation foundUnpatentable
“described in earlier embodiments would not be consistent with Kim’s statement that previously described elements are “omitted” in the Figures 17A to 22B section “for concise description.” As admitted by Patent Owner, it would be a “reasonable inference” that materials described in a first embodiment for a particular hypothetical layer L would also be used for that layer L in later embodiments absent an express statement to the contrary “because you have just omitted that sort of duplicative description.” Tr. 37:9–38:12. Kim’s Figures 17A–22B do not further address the underlying staircase structure that was detailed in the descriptions of the Figures 4–15 embodiments. Thus, it would similarly be a “reasonable inference” that aspects of the stack structure would be understood to apply to the same stack in the embodiments of Figures 17A–22B, which rely upon, in unaltered form, the earlier-described elements of the stack. stack on bottom, they “replace” and “exclude” any prior description of a gate-stack-on-top. PO Resp. 18–19 (citing Ex. 2019 ¶¶ 40–41; Ex. 1005 ¶¶ 185–187 (describing the etch-stop layer as covering the sacrificial layers only at their end portions)). However, as admitted by Patent Owner, all of Kim’s Figures show only a gate-stack-on-bottom structure. Tr. 41:6–7 (“For the first embodiment, it is true that figures show the gate stack on bottom.”). The fact that Kim’s Figures 17A–22B, which add etch-stop and barrier layers to the gate stack, are shown only as gate stack on bottom is merely consistent with the uniform use of gate-stack-on-bottom in Kim’s Figures, which show the layer-by-layer construction of its device. Like Figures 4–15, Figures 17A–22B exemplify rather than limit the description of the previously described memory stack, and do not exclude the gate-stack-onbottom description of the memory stack. Kim can be used for all it realistically teaches, including descriptions in its disclosure that are not represented by specific Figures. See In re Chapman, 357 F.2d 418, 424 (C.C.P.A. 1966) (stating that a reference “is not limited to the disclosures in its specific illustrative examples.”). Accordingly, the record supports Petitioner’s assertion that Kim’s teaching of a gate-stack-on-top alternative for the memory stack would be understood by a POSITA as a memory stack option applicable to its other embodiments having that same memory stack.” slip op. at 11
Patent outcomesUS 11,101,276 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 11,101,276 - Meta Platforms, Inc. v. Sitnet LLCAdverse judgmentPTAB · Jul 15, 2026 · IPR2026-00100 · APJ Thu A Dang · IPR · Adverse judgment
The Board granted adverse judgment against SitNet after its disclaimer left no challenged claims remaining in the instituted trial.
RulingsAdverse judgment- Adverse judgmentAdverse judgmentGranted
“judgment include: . . . [c]ancellation or disclaimer of a claim such that the party has no remaining claim in the trial.” 37 C.F.R. § 42.73(b)(2). “The application of the [adverse judgment] rule on its face does not turn on the patentee’s characterization of its own request.” Arthrex, Inc. v. Smith & Nephew, Inc., 880 F.3d 1345, 1349 (Fed. Cir. 2018). In this case, Patent Owner’s disclaimer of all claims of the ’290 patent leaves no claims remaining in the trial. Although Patent Owner argues that “it was filed to conserve the limited resources of the Board and the Parties in light of the fact that the ’290 Patent is no longer involved in any copending litigation” (Ex. 3001), we deem such argument not a persuasive reason as to why we should not apply § 42.73(b)(2), or why termination is more appropriate. Pursuant to 37 C.F.R. § 42.73(b)(2), we construe Patent Owner’s disclaimer of all claims at trial as a request for adverse judgment, which we grant.” slip op. at 3
NonePatents in suitUS 10,117,290 - Ipr2026-00310Institution deniedPTAB · Jul 14, 2026 · IPR2026-00310 · APJ John A Squires · IPR · Director review
The Director denied institution of IPR2026-00310 after review of discretionary and non-merits considerations.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 12,063,402 - Ipr2026-00308Institution deniedPTAB · Jul 14, 2026 · IPR2026-00308 · APJ John A Squires · IPR · Director review
Institution of IPR2026-00308 was denied after review of discretionary and non-merits considerations.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 11,017,668 - Ipr2026-00307Institution deniedPTAB · Jul 14, 2026 · IPR2026-00307 · APJ John A Squires · IPR · Director review
The Director denied institution of IPR2026-00307 after review of discretionary and non-merits considerations.
RulingsDirector review decision- Other 314aInstitution denied discretionary otherInstitution denied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
- Director reviewDirector review, deniedDenied
“Before JOHN A. SQUIRES, Under Secretary of Commerce for Intellectual Property and Director of the United States Patent and Trademark Office. NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 11,164,456 - Ipr2026-00306Institution deniedPTAB · Jul 14, 2026 · IPR2026-00306 · APJ John A Squires · IPR · Director review
The Director denied institution of IPR2026-00306 after reviewing discretionary and non-merits considerations.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 10,916,138 - Ipr2026-00305Institution deniedPTAB · Jul 14, 2026 · IPR2026-00305 · APJ John A Squires · IPR · Director review
Institution of IPR2026-00305 was denied because the petitioner failed to show a reasonable likelihood of prevailing on at least one challenged claim.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings: IPR2026-00255 IPR2026-00284 IPR2026-00307 IPR2026-00261 IPR2026-00300* IPR2026-00308 IPR2026-00281 IPR2026-00305 IPR2026-00309” slip op. at 1
- PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)Other
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings: IPR2026-00255 IPR2026-00284 IPR2026-00307 IPR2026-00261 IPR2026-00300* IPR2026-00308 IPR2026-00281 IPR2026-00305 IPR2026-00309” slip op. at 1
NonePatents in suitUS 7,840,427 - Ipr2026-00282Institution deniedPTAB · Jul 14, 2026 · IPR2026-00282 · APJ John A Squires · IPR · Director review
The Director denied institution of IPR2026-00282 after review of discretionary and non-merits considerations.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 9,519,729 - Ipr2026-00283Institution deniedPTAB · Jul 14, 2026 · IPR2026-00283 · APJ John A Squires · IPR · Director review
The Director denied institution of IPR2026-00283 after review of discretionary and non-merits considerations.
RulingsDirector review decision- Director reviewDirector review, deniedDenied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
- Other 314aInstitution denied discretionary otherInstitution denied
“NOTICE Pursuant to 35 U.S.C. § 314(a), after review of discretionary and non- merits considerations, institution of inter partes review is denied in the following proceedings:” slip op. at 1
Discretionary denialPatents in suitUS 8,533,628
Holdings, summaries, rulings, issues, outcomes, winners and claim constructions shown for a decision were generated by a large language model reading the opinion. They are a guide to the decision, not the decision. Confirm every one against the court's own text before relying on it. Outcomes read from the patent owner’s side. Party names are extracted from the decision and are missing on about 900 short Director denials and scans, which carry the trial number instead.