- Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentablePTAB · Jul 6, 2026 · IPR2025-00191 · APJ Michael T Cygan · IPR · Final written decision
Claims 3, 8, 11, 12, and 19 are unpatentable under §103; Petitioner did not show claims 6, 9, 10, 13–18, and 20 unpatentable.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“at the critical time “would have had a Bachelor of Science degree in electrical engineering or a similar discipline, along with 2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 27 (citing Ex. 1003 ¶¶34–38). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, how it is manufactured, and its component parts.” Id. Patent Owner does 5 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. Pet. 100; PO. Resp. circuit design. PO Resp. 9–10 (citing Ex. 2021 ¶ 35). Neither Patent Owner nor Dr. Campbell considers the obviousness of the claims to turn on the precise definition of the level or ordinary skill in the art. PO Resp. 10; Ex. 2021 ¶ 35. For purposes of this Decision, we adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’322 patent and the prior art of record.” slip op. at 7
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededDecided for petitioner
“C. Claim Construction Neither party proposes any express claim construction. Pet. 27 (stating claims should receive their “plain and ordinary meaning”); PO Resp. 10 (stating that Petitioner’s challenges fail “under any reasonable construction”). In an inter partes review, we construe a patent claim “using the same claim construction standard that would be used to construe the claim in a civil action under 35 U.S.C. [§] 282(b).” 37 C.F.R. § 42.100(b). Under this standard, the words of a claim generally are given their “ordinary and customary meaning,” which is the meaning the term would have to a person of ordinary skill at the time of the invention, in the context of the entire patent including the specification. Phillips v. AWH Corp., 415 F.3d 1303, 1312–13 (Fed. Cir. 2005) (en banc). We determine no terms require express construction for purposes of this Decision.” slip op. at 8
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundReasonable expectation foundDecided for petitioner
“We determine that such a configuration would be neither inoperable nor significantly undesirable. Dr. Campbell testified that he does not argue that this configuration would be inoperable. Ex. 1106, 74:12–17; Ex. 2021 ¶60. Dr. Lee testifies that this configuration is “consistent with Nishikawa[123]’s Figure 14B.” Ex. 1105 ¶ 13. Dr. Lee further testifies that this configuration would not necessarily require a larger footprint, but instead, “could simply replace the trenches, abutting the device edge.” Id. Dr. Campbell testified that if the circular TAC replaced the rectangular trench, “I don’t know what it would be or exactly where it would be,” and therefore, “I can’t say what the size of the red circle would have to be.” Ex. 1106, 83:19–84:3. Therefore, the record does not support finding a circular TAC to have a larger footprint. Absent a larger footprint, there is no evidence that the end-connected TAC would be undesirable.” slip op. at 15
- Expert testimonyPetitioner expert creditedPatent owner expert discountedMixed
“nor significantly undesirable. Dr. Campbell testified that he does not argue that this configuration would be inoperable. Ex. 1106, 74:12–17; Ex. 2021 ¶60. Dr. Lee testifies that this configuration is “consistent with Nishikawa[123]’s Figure 14B.” Ex. 1105 ¶ 13. Dr. Lee further testifies that this configuration would not necessarily require a larger footprint, but instead, “could simply replace the trenches, abutting the device edge.” Id. Dr. Campbell testified that if the circular TAC replaced the rectangular trench, “I don’t know what it would be or exactly where it would be,” and therefore, “I can’t say what the size of the red circle would have to be.” Ex. 1106, 83:19–84:3. Therefore, the record does not support finding a circular TAC to have a larger footprint. Absent a larger footprint, there is no evidence that the end-connected TAC would be undesirable.” slip op. at 15
Patent outcomesUS 11,581,322 mixedClaim construction§ 103 obviousnesscites KSR · GrahamPatents in suitUS 11,581,322 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jun 1, 2026 · IPR2025-00117 · APJ Michael T Cygan · IPR · Final written decision
Claims 1–19 are unpatentable: claims 1–9, 11–16, 18, and 19 as obvious over Kim; claims 10 and 17 as obvious over Kim and Fang, Park, and Park and Fang.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 27 (citing Ex. 1003 ¶ 42). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not dispute Petitioner’s definition. PO Resp. 7. We adopt Petitioner’s proposed 4 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. Pet. 103; PO Resp. the ’711 patent and the prior art of record.” slip op. at 5
- Claim Construction › Intrinsic evidence (Phillips canons) › Lexicography (patentee as own lexicographer)Term construed petitioner constructionDecided for petitioner
“Based on the record before us, we agree with Petitioner that “on a surface” should be interpreted in line with the definition of “on” set forth in the ’711 patent. Ex. 1001, 4:1–6. We particularly note that the ’711 patent states that “‘on’ . . . should be interpreted in the broadest manner” and that “on” is not limited to “directly on.” Id. Instead, the ’711 patent states that “‘on’ also includes the meaning of ‘on’ something with an intermediate feature or layer therebetween.” Id. Patent Owner agrees that this definition controls the “standalone ‘on’” term such that A may be on B even if there is an intervening layer between them. Tr. 55:8–11 (“The standalone ‘on,’ we agree in the context of the patent, you can have intervening layers. I think the patent is clear about that.”). Claim 14 recites that the etch-stop layer is “on” something; i.e., “on a side surface and a top surface of each step.” Ex. 1001, 16:20–22. Patent Owner agrees that a surface is a “something.” Tr. 56:5–8 (“surface obviously is a something”). Substituting the “a “‘on’ something with an intermediate feature or layer therebetween” results in claim 14 reading as, “on a surface with an intermediate feature or layer therebetween.” Unlike “directly on,” which specifies the relation between two things, “a surface” may merely indicate the thing that something is “on,” particularly when “on” is “interpreted in the broadest manner” as expressly required by the ’711 patent.” slip op. at 7
- Expert testimonyPatent owner expert discountedDecided for petitioner
“Although Dr. Campbell testified in his deposition in response to Petitioner’s counsel that “on the surface” requires direct contact with the surface, his interpretation was based on “embodiments of” the patent rather than a general understanding of a person skilled in the art confronted with that term. Ex. 1027, 122:6–25, 124:6–23 (“I’m not sure if there are other sources for that, but it was on the ’711, so I’ve taken it there.”). Dr. Campbell, upon questioning from Patent Owner’s counsel, later stated that “an expert in semiconductor fabrication” would understand “on the surface” to mean “contact between one layer and another . . . with nothing in between.” Id. at 146:25–147:6. However, Dr. Campbell did not explain why such an interpretation is particular to the semiconductor fabrication art, or provide other explanation or support for this statement, which is in tension with the definition of “on” in the ’711 patent. Accordingly, we significantly discount the weight accorded to that statement. Phillips, 415 F.3d at 1318 (stating, “conclusory, unsupported assertions by experts as to the definition of a claim term are not useful to a court. Similarly, a court should discount any expert testimony ‘that is clearly at odds with the claim construction mandated by the claims themselves, the written description, and patent.’”). On balance, Dr. Campbell’s testimony is best understood as a description of certain Figures of the ’711 patent rather than a representation of an ordinarily skilled person’s understanding of the term “on the surface.” See Ex. 2009 ¶ 47 (describing Figs. 1, 3, and 4 as depicting layers in contact with the underlying layer or substrate). For example, Dr. Campbell describes Figure 9A as having a barrier layer “on and directly contacting the top and side surfaces of each step.” Id. ¶ 28 (emphasis added) (citing inter alia Ex. 1001, 7:6–67). Dr. Campbell does not explain why, beyond the fact that many Figures show layers as adjacent and in contact, a person of ordinary skill in the relevant art would understand those Figures to limit the claim language rather than illustrating particular embodiments that fall within a broader scope of claims 14 and 15. See Hill-Rom Servs., Inc. v. Stryker Corp., 755 F.3d 1367, 1371 (Fed. Cir. 2014) (“While we read claims in view of the specification, of which they are a part, we do not read limitations from the embodiments in the specifications into the claims.”).” slip op. at 9
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundReasonable expectation foundUnpatentable
“We agree with Petitioner that Kim’s first and second section are described as compatible, not mutually exclusive, embodiments. Kim’s second section builds further layers upon the structure of its first section, and states: In these embodiments, the same elements as in the embodiments previously described with reference to FIGS. 5A through 14A and FIGS. 5B through 14B will be denoted by the same reference numbers therein, and for concise description, overlapping description of elements previously described with reference to FIGS. 5A through 14A and FIGS. 5B through 14B may be omitted. Ex. 1005 ¶ 184 (emphasis added). Patent Owner argues that only the embodiments in Figures 17A–22B describe an etch-stop layer and a barrier layer (as claimed), and that the language cited for a gate-stack-on-top configuration (e.g., Ex. 1005 ¶¶ 90, 91, and 240) is “conspicuously absent from the description of Figures 17A–22B.” PO Resp. 20 (citing Ex. 2009 ¶ 36). However, Figures 17A–22B do not further address the underlying staircase structure that was detailed in the descriptions of the Figures 4 through 15 embodiments. While Figures 17A–22B show a gate-stack-on-bottom configuration, this merely continues the gate-stack-on-bottom illustrations that were used in all of the previous Figures, even for those in which it is undisputed that a gate-stack-on-top configuration is a described alternative. The Figures exemplify rather than limit the description of the gate-stack-on-bottom view in Figures 4–15 and do not exclude the gate-stack on bottom description of the embodiments exemplified by those figures.” slip op. at 17
Patent outcomesUS 10,672,711 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,672,711 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.No claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00911 · APJ Kimberly Mcgraw · IPR · Final written decision
Claim 10 was not shown unpatentable under § 103 over Toyama because the challenge did not remedy the deficiencies in its nonobvious base claim 8.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedOther
“Petitioner’s proposed definition appears to be consistent with the cited prior art and the disclosure of the ’806 patent, and we adopt it for purposes definition of a POSITA.” slip op. at 8
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“In our Decision on Institution, we noted that the parties disputed construction of “each local contact” found in dependent claim 10, and “dielectric structure” recited in independent claim 8. Inst. Dec. 8–9. We determine that no express construction of “each local contact” recited in claim 10, or any other claim term, is required to resolve the issues in dispute in this proceeding.” slip op. at 9
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)Not shown unpatentableNot shown unpatentable
“independent claim 8 would have been obvious for the reasons set forth in its petition in the 791-IPR. See id. at 1 (stating the present Petition maintains the same grounds set forth in IPR2024-00791). As explained in our Final Written Decision (Ex. 3001) in the 791-IPR issued concurrently, Petitioner did not show by a preponderance of the evidence that independent claim 8 would have been obvious over Toyama under any of Petitioner’s three alternative arguments. None of Petitioner’s arguments set forth in the present Petition, including the arguments directed to claim 10, remedy the deficiencies regarding its base claim 8. See Pet. 53–31, 98–101, 124–125; see also Reply. Accordingly, for the same reasons set forth in the Final Written Decision in the 791-IPR issued concurrently, Petitioner has not shown by a preponderance of the evidence that independent claim 8, and therefore dependent claim 10, would have been obvious over Toyama. See In re Fine, 837 F.2d 1071, 1076 (Fed. Cir. 1988) (“Dependent claims are nonobvious under section 103 if the independent claims from which they depend are nonobvious.”); Ex. 3001.” slip op. at 14
- Expert testimonyNot reached
“Petitioner relies on the Declaration of Jack C. Lee, Ph. D. (Ex. 1003) and the Reply Declaration of Jack C. Lee, Ph.D. (Ex. 1043) in support of its 2 The Leahy-Smith America Invents Act (“AIA”), Pub. L. No. 112–29, 125 Stat. 284 (2011), revised 35 U.S.C. §§ 102 and 103 effective March 16, 2013. Because the ’806 patent has an effective filing date after March 16, 2013 (Ex. 1001, codes (22), (63)), we refer to the AIA version of Sections 102 and 103. 3 Toyama, US Pub. No. 2017/0179026 A1, published June 22, 2017 (Ex. 1005). 4 Petitioner characterizes its alternative arguments of unpatentability of claim 10 as based on three “grounds.” See Pet. 15. Because each of Petitioner’s arguments are based on the same reference, albeit different embodiments, we characterize Petitioner’s challenges as three alternative arguments based on a single ground because each argument relies on the same reference. Ph.D. (Ex. 2005). Transcripts of the depositions of Dr. Lee (Exs. 2006, 2010) and of Dr. Yang (Ex. 1044) have also been submitted into the record.” slip op. at 7
Patent outcomesUS 10,937,806 not shown unpatentableClaim construction§ 103 obviousnesscites PhillipsPatents in suitUS 10,937,806 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00909 · APJ Michael T Cygan · IPR · Final written decision
Claims 1–7 and 18 are unpatentable as obvious over Toyama, based on the First Exemplary Structure and, for some limitations, the Second Modification.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND 2 We apply AIA 35 U.S.C. §§ 102, 103 to the ’378 patent because it was filed after, and never claimed the benefit of an effective filing date before, March 16, 2013. Petitioner also applies AIA §§ 102 and 103. See Pet. 2, 24–26. 3 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. Pet. 104; PO Resp. experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 33 (citing Ex. 1003 ¶¶ 37–39). Petitioner further asserts that a POSITA “would also have been aware of and generally knowledgeable about semiconductor manufacturing and 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not object to such a definition. PO Resp. 13. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the Specification of the ’378 patent and the prior art of record.” slip op. at 5
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached
“Petitioner asserts that only the term “a staircase structure in the alternating layer” should be construed, and that the term should be construed as “a staircase structure in the alternating layer stack.” Pet. 32–33. Patent Owner does not dispute this construction, and our determination would be unaffected by Petitioner’s proposed construction. Therefore, we need not provide an express construction of this term. See Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (noting that “we need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy’” (quoting Vivid Techs., Petitioner asserted that all other terms should receive their plain and ordinary meaning. Pet. 33.” slip op. at 6
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITAPlain and ordinary meaningDecided for petitioner
“Because neither the language of claim 15 nor the Specification indicates a narrower meaning, we agree with Petitioner that the phrase “a substrate with an isolation structure” should be given its plain meaning. Patent Owner argues that the plain meaning of “with” is “having” or “inclusive of.” PO Sur-reply 2 (citing Ex. 1038, 8). Citing the same dictionary, Petitioner argues that the plain meaning of “with” includes objects that are separate. Pet. Reply 3 (stating, “In the sentence ‘Alice went to school with Bob,’ it would be nonsensical to interpret that to mean that Bob is part of Alice.”) (citing Ex. 1038, 7). The cited definition of “with” states that it may indicate “accompaniment,” such as “went there [with] her,” as well as combination (“milk [with] honey”). Ex. 1038, 7. Based on the evidence and arguments presented, we determine that the phrase “a substrate with an isolation structure” should be given its plain meaning, which includes accompaniment (A is accompanied by B) as well as combination (A is part of B, or A and B are a part of C).4” slip op. at 9
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“We are persuaded by Petitioner that the lower volume of Toyama’s dielectric fill portion teaches the isolation structure and the upper volume of Toyama’s dielectric fill portion teaches the dielectric structure. First, the structure may be the same material; i.e., SiO2. Ex. 1001, 10:37–40 (isolation structure 233 filled with SiO2), 10:46–47 (dielectric structure can include SiO2, and can include the same material as dielectric layer 230), 10:12–14 (dielectric layer 230 is formed of SiO2). Second, the ’378 patent indicates that the dielectric structure may be “aligned to” and “in contact with” the isolation structure. Id. at 10:30–36. Thus, the two structures of the ’378 patent may appear as two aligned and contacting structures; e.g., a single column of the same material. Third, the ’378 patent specification describes that the dielectric structure and a top portion of the isolation structure may be formed in the same deposition step. When etching the opening 600 that is to be filled with dielectric structure 232, “opening 600 may extend partially into STI structure 233;” i.e., “the etch process used to form opening 600 may also remove (recess) portion of the top surface of STI structure 233.” Id. at 15:12–20; Fig. 6. Then, “opening 600 can be filled with a dielectric layer 702,” which may be the same SiO2 material as the isolation structure, and “[a]s a result, dielectric structure 232 is formed.” Id. at 15:42–54. Thus, the ’378 patent describes a dielectric structure that partially replaces or re-forms, with the same material, its isolation structure. The ’378 patent does not mention whether this results in a dielectric structure that extends into the isolation structure or an isolation structure re-filled to its original height, and it would not appear to matter because both structures may be composed of the same material. The ’378 patent’s indifference to the exact boundary between dielectric structure 232 and isolation structure 233 during formation from the same material indicates that these structures need not be taught by distinct elements. applicable only if the ’378 patent describes that the isolation region and dielectric structure were formed as a single unitary structure. PO Resp. 51; PO Sur-reply 16–18. Retractable Techs. focuses on whether the two elements at issue “could be formed as an integral structure in the first instance,” not whether they were formed integrally. Retractable Techs., 653 F.3d at 1304 (“The specifications further disclose a method to couple the two structures . . . to allow some diffusion or insipient melting to occur where they touch . . . . This passage suggests that [the structures] could be formed as an integral structure in the first instance”). Retractable Techs. looks to whether the specification suggests that the claim terms require separate structures. Powell v. Home Depot U.S.A., Inc., 663 F.3d 1221, 1232 (Fed. Cir. 2011). Patent Owner’s focus on whether the claimed structures were disclosed as being separately formed disregards the issue of whether the separately claimed structures require specific methods of forming those structures. Here, as in Retractable Techs. and Powell, the Specification does not indicate any particular structure or function for the structures that results from their separate steps of deposition. Thus, as held in Retractable Techs. and Powell, the two portions of Toyama “need not be two separate parts” to teach two separate claim limitations. Retractable Techs., 635 F.3d at 1303–04. Consequently, we determine that the claim language does not support a requirement that these structures be separate and distinct. Patent Owner’s further arguments are not availing. Contrary to Patent Owner’s argument, in our “Third” point, supra, we do not state that the isolation structure and the dielectric structure are formed in the same deposition step. PO Resp. 52–53; PO Sur-reply 18; Supra at 34. We only” slip op. at 33
Patent outcomesUS 10,658,378 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,658,378 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00788 · APJ Michael T Cygan · IPR · Final written decision
Claims 15–17, 19, and 20 are unpatentable as obvious over Toyama, Mushiga, and Mushiga with Makala.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 27 (citing Ex. 1003 ¶¶ 36–37). Petitioner further asserts March 16, 2013. Petitioner also applies AIA §§ 102 and 103. See Pet. 2, 24–26. 3 Neither party presented evidence or arguments regarding objective evidence of non-obviousness during trial. knowledgeable about semiconductor manufacturing and 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. (emphasis omitted). Patent Owner does not object to this assessment. PO Resp. 12. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’378 patent and the prior art of record.” slip op. at 5
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached
“Petitioner does not dispute Patent Owner’s construction, asserting that its grounds render obvious this limitation under Patent Owner’s construction propose construction of the term “through array contact,” which was at issue in the Preliminary Response and in the parallel district court proceeding. Id. Nor have the parties indicated, in response to Board inquiry, that any relevant construction has occurred. See Paper 34. with Petitioner that Patent Owner does not dispute this aspect of the “a dielectric structure on the isolation structure” limitation in Petitioner’s assertions based on Toyama. PO Sur-reply 20–21. Patent Owner does dispute that Mushiga’s insulating spacer 586 is “on” the isolation structure. PO Resp. 70–72. However, because Petitioner relies upon a dielectric structure that includes other portions of Mushiga that Patent Owner does not dispute to be on the asserted isolation structure, the dispute is whether Petitioner is correct to include multiple components as part of a single dielectric structure, and not whether spacer 586 is on an isolation structure. Id. Because Petitioner’s assertions and our determination would be unaffected by its proposed construction, we need not construe this term. See Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (noting that “we need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy’” (quoting Vivid Techs., Inc. v. Am. Sci. & Eng’g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))).” slip op. at 7
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITAPlain and ordinary meaningDecided for petitioner
“Patent Owner’s citations to the Specification do not support its proposed construction. Patent Owner relies on multiple embodiments, only one of which describes a substrate “with” an isolation structure. PO Resp. 21 (citing Ex. 1001, 22:27–28). For example, one of Patent Owner’s cited embodiments recites “on” an isolation region, but Patent Owner specifically argues that the “on” embodiment does not apply to the claimed “with” embodiment. Id. at 22 (denying that “the ‘with’ relationship encompasse[s] the ‘on’ relationship”). Only one of the embodiments cited is clearly within the scope of the “with” claim language, and that embodiment describes no more than the claim language itself. Ex. 1001, 22:27–28. Moreover, Figure 2, cited by Patent Owner, is an illustration “according to some embodiments,” but is not described as depicting all embodiments. Ex. 1001, 3:35–36. These other embodiments need not be included in claim 15’s “with” language because other claims (not at issue in this proceeding) specifically recite language from other embodiments. Ex. 1001, 23:20–21 (“a dielectric structure on an isolation region of the substrate”), 23:58 (“forming an isolation structure on a substrate”). Thus, the specification of the ’378 patent does not limit “a substrate with an isolation structure” in claim 15 to “part of” an isolation structure, such as in a shallow region or other partial-depth portion of the substrate. Because neither the language of claim 15 nor the Specification indicates a narrower meaning, we agree with Petitioner that the phrase “a Patent Owner argues that the plain meaning of “with” is “having” or “inclusive of.” PO Sur-reply 2 (citing Ex. 1038, 7). Citing the same dictionary, Petitioner argues that the plain meaning of “with” includes objects that are separate. Pet. Reply 3 (stating, “In the sentence ‘Alice went to school with Bob,’ it would be nonsensical to interpret that to mean that Bob is part of Alice.”) (citing Ex. 1038, 7). The cited definition of “with” states that it may indicate “accompaniment,” such as “went there [with] her,” as well as combination (“milk [with] honey”). Ex. 1038, 7. Based on the evidence and arguments presented, we determine that the phrase “a substrate with an isolation structure” should be given its plain meaning, which includes accompaniment (A is accompanied by B) as well as combination (A is part of B, or A and B are a part of C).” slip op. at 9
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“We are persuaded by Petitioner that the lower volume of Toyama’s dielectric fill portion teaches the isolation structure and the upper volume of Toyama’s dielectric fill portion teaches the dielectric structure. First, the ’378 patent indicates that both the dielectric structure and the isolation structure may be the same material; i.e., SiO2. Ex. 1001, 10:37–40 (isolation structure 233 filled with SiO2), 10:46–47 (dielectric structure can include SiO2, and can include the same material as dielectric layer 230), 10:12–14 (dielectric layer 230 is formed of SiO2). Second, the ’378 patent indicates that the dielectric structure may be “aligned to” and “in contact with” the isolation structure. Id. at 10:30–36. Thus, the two structures of the ’378 patent may appear as two aligned and contacting structures; e.g., a single column, of the same material. Third, the ’378 patent specification describes that the dielectric structure and a top portion of the isolation structure may be formed in the same deposition step. When etching the opening 600 that is to be filled with dielectric structure 232, “opening 600 may extend partially into STI structure 233;” i.e., “the etch process used to form opening 600 may also remove (recess) portion of the top surface of STI structure 233.” Id. at 15:12–20. Then, “opening 600 can be filled with a dielectric layer 702,” which may be the same SiO2 material as the isolation structure, and “[a]s a result, dielectric structure 232 is formed.” Id. at 15:42–54. Thus, the ’378 patent describes a dielectric structure that partially replaces or re-forms, with the same material, its isolation structure. The ’378 patent does not mention whether this results in a dielectric structure that extends into the isolation structure or an isolation structure re-filled to its original height, and it would material. The ’378 patent’s indifference to the exact boundary between dielectric structure 232 and isolation structure 233 during formation from the same material indicates that these need not be taught by distinct elements. We do not agree with Patent Owner that Retractable Techs. is applicable only if the ’378 patent describes that the isolation region and dielectric structure were formed as a single unitary structure. PO Resp. 50; PO Sur-reply 9. Retractable Techs. focuses on whether the two elements at issue “could be formed as an integral structure in the first instance,” not whether they were formed integrally. Retractable Techs., 653 F.3d at 1304. (“The specifications further disclose a method to couple the two structures . . . to allow some diffusion or insipient melting to occur where they touch . . . . This passage suggests that [the structures] could be formed as an integral structure in the first instance”). Retractable Techs. looks to whether the specification suggests that the claim terms require separate structures. Powell v. Home Depot U.S.A., Inc., 663 F.3d 1221, 1232 (Fed. Cir. 2011). Patent Owner’s focus on whether the claimed structures were disclosed as being separately formed disregards the issue of whether the separately claimed structures require specific methods of forming those structures. Here, as in Retractable Techs. and Powell, the Specification does not indicate any particular structure or function for the structures that results from their separate steps of deposition. Thus, as held in Retractable Techs. and Powell, the two portions of Toyama “need not be two separate parts” to teach two separate claim limitations. Retractable Techs., 635 F.3d at 1303– 04. Consequently, we determine that the claim language does not support a requirement that these structures be separate and distinct.” slip op. at 32
Patent outcomesUS 10,658,378 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,658,378 - PTAB · Dec 12, 2025 · IPR2025-01116 · APJ Christopher M Kaiser · IPR · Institution
The Board instituted IPR of claims 1–15 on all asserted grounds, finding a reasonable likelihood that claim 1 would have been obvious over Sudre, Lee, and Penven.
RulingsInstitution decision- PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted
“determine whether to institute an inter partes review under 35 U.S.C. § 314 and 37 C.F.R. § 42.4(a). Inter partes review may not be instituted unless “the information presented in the petition filed under [35 U.S.C.] section 311 and any response filed under [35 U.S.C.] section 313 shows that there is a reasonable likelihood that the petitioner would prevail with respect to at least 1 of the claims challenged in the petition.” 35 U.S.C. § 314(a). “When instituting inter partes review, the Board will authorize the review to proceed on all of the challenged claims and on all grounds of unpatentability asserted for each claim.” 37 C.F.R. § 42.108(a) (2023). In other words, a decision to institute under § 314 may not institute on fewer than all claims challenged in the petition. SAS Inst., Inc. v. Iancu, 138 S. Ct. 1348, 1359–60 (2018). In addition, if the Board institutes trial, it will “institute . . . on all grounds in the petition.” PTAB Consolidated Trial Practice Guide, 5–6 (Nov. 2019)1 (“CTPG”); see also PGS Geophysical AS v. Iancu, 891 F.3d 1354, 1360 (Fed. Cir. 2018) (interpreting the statute to require “a simple yes-” slip op. at 2
- Skill levelSkill level petitioner adoptedDecided for petitioner
“had at least (1) a Bachelor’s Degree (or higher) in material science, materials engineering, mechanical engineering, textile engineering, or a related field, and (2) a minimum of two years of working experience in textiles engineering, fibers and textiles manufacturing, or a related field.” Pet. 4 (citing Ex. 1003 ¶¶ 21–22). Petitioner also argues that “[a]dditional education could substitute for professional experience, and vice versa.” Id. On the present record, Patent Owner does not contest Petitioner’s proposed level of ordinary skill. Prelim. Resp. 25–26. For purposes of this Decision, we adopt Petitioner’s assessment of the level of ordinary skill in the art, as it appears consistent with the ’566 patent and the asserted prior art. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir. 2001).” slip op. at 9
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“Both parties argue that no claim terms require express construction at this stage of the proceeding. Pet. 3; Prelim. Resp. 26. On the present record, we agree. See Realtime Data, LLC v. Iancu, 912 F.3d 1368, 1375 (Fed. Cir. 2019) (“The Board is required to construe ‘only those terms . . . that are in controversy, and only to the extent necessary to resolve the controversy.’” (quoting Vivid Techs., Inc. v. Am. Sci. & Eng’g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))). To the extent the parties’ arguments regarding unpatentability do address claim construction issues, we address these issues below.” slip op. at 10
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundDecided for petitioner
“articulated a reason why a person of ordinary skill in the art would have combined the teachings of Sudre, Lee, and Penven. Prelim. Resp. 60–63. In particular, Patent Owner argues that a person of ordinary skill in the art “would not have been motivated to look into Penven to modify the teachings of Lee because Lee and Penven disclose substantially different structures.” Id. at 60–61. This argument does not address Petitioner’s proposed reason to combine, which looks to Lee and Penven each to modify Sudre, not to Penven to modify Lee. See Pet. 79–81. In addition, “[c]ombining the teachings of references does not involve an ability to combine their specific structures.” In re Nievelt, 482 F.2d 965, 968 (CCPA 1973). In other words, “[t]he test for obviousness is not whether the features of a secondary reference may be bodily incorporated into the structure of the primary reference . . . . Rather, the test is what the combined teachings of the references would have suggested to those of ordinary skill in the art.” In re Keller, 642 F.2d 413, 425–26 (CCPA 1981). Petitioner provides “some articulated reasoning with some rational underpinning” to combine the teachings of Sudre with those of Lee and Penven. KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 418 (2007). In particular, Petitioner directs us to Sudre’s teaching of “a method for manufacturing PMC,” to Sudre’s lack of teaching of “specific parameters, such as warp thread size and spacing” to satisfy the “particular requirements” of its fabric. Pet. 79 (citing Ex. 1003 ¶¶ 248–250; Ex. 1004, 1:2–5, 6:14–17). As Petitioner points out, id. at 79–80, Lee and Penven provided yarn diameters and loop diameters that were conventional, and there is evidence of record that a person of ordinary skill in the art would have used these conventional diameters in constructing Sudre’s paper machine clothing. Ex. 1003 ¶¶ 258–261, 263–266; Ex. 1006, 3:64–66.” slip op. at 14
Claim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 11,261,566 - PTAB · Nov 6, 2025 · PGR2025-00040 · APJ Kimberly Mcgraw · PGR · Institution
The Board instituted PGR on claims 1–9, 11–33, and 35–38 on all petition grounds, finding it more likely than not that Hassfjell-Hoff anticipates at least claim 1.
RulingsInstitution decision- PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted
“Under 35 U.S.C. § 324(a), a post-grant review may be instituted only if “the information presented in the petition . . . demonstrate[s] that it is more likely than not that at least 1 of the claims challenged in the petition is unpatentable.” Post-grant review is available for patents that issue from applications that at one point contained at least one claim with an effective filing date on or after March 16, 2013. See Leahy-Smith America Invents Act, Pub. L. No. 112-29, 125 Stat. 284 (2011) (“AIA”), §§ 3(n)(1), 6(f)(2)(A). After considering the briefing and the evidence of record, for the reasons set forth below, we determine that Petitioner has shown that the ’437 patent is eligible for post-grant review and that it is more likely than not that at least one challenged claim of the ’437 patent is unpatentable under § 324(a). Accordingly, we institute a post-grant review of all challenged claims of the ’437 patent.” slip op. at 2
- Adverse judgmentAdverse judgmentOther
“Here, Patentee Sciencons AS filed a statutory disclaimer of claims 10 and 34 of the ’437 patent. Ex. 2001; Prelim. Resp. 43. Based on our review of Exhibit 2001 and the Office’s public records, we find that the disclaimer of claims 10 and 34 complies with the above-listed requirements of 37 C.F.R. § 1.321(a). Accordingly, we treat claims 10 and 34 as having never been part of the ’437 patent. See Vectra Fitness, Inc. v. TNWK Corp., 162 F.3d 1379, 1383 (Fed. Cir. 1998) (“This court has interpreted the term ‘considered as part of the original patent’ in [35 U.S.C.] § 253 to mean that the patent is treated as though the disclaimed claims never existed.”). Because post-grant review cannot be instituted based on disclaimed claims, claims 10 and 34 are outside the scope of this proceeding. 37 C.F.R. § 42.207(e) (“No post-grant review will be instituted based on disclaimed claims.”); General Elec. Co. v. United Techs. Corp., IPR2017-00491, Paper 9 (PTAB July 6, 2017) (precedential) (denying institution in view of a statutory disclaimer of all the challenged claims). Thus, we confine our analysis in this Decision to claims 1–9, 11–33, and 35– 38, the remaining challenged claims that have not been disclaimed.” slip op. at 6
- PTAB / AIA Trials › Real party in interest / privityGranted
“Sciencons AS also states that ARTBIO, Inc. is responsible for defending the ’437 patent in this proceeding and requests that ARTBIO, Inc. be included in the caption for this proceeding.2 Paper 4, 1. ARTBIO, Inc. has signed powers of attorney appointing the same practitioners that were appointed by Sciencons AS to transact all business associated with the instant post-grant review review of the ’437 patent. See Paper 3. To date, no objection has been raised to Patent Owner’s request. Given Sciencons AS’s representation that ARTBIO, Inc. is currently the exclusive licensee of the ’437 patent and is responsible for defending the ’437 patent, we grant Sciencons AS’s unopposed request that ARTBIO, Inc. be included in the caption. For convenience we refer to Sciencons AS and the purported exclusive licensee ARTBIO, Inc. collectively as “Patent Owner.” As stated supra, to the extent any party disputes ARTBIO, Inc.’s right to participate in this proceeding or to be included in the caption, the party shall request authorization to brief the issue within 10 business days of this Decision.” slip op. at 3
- Skill levelSkill level petitioner adoptedDecided for petitioner
“nuclear chemistry, radiochemistry, or materials science, or a comparable field of study, plus approximately two to three years of professional experience with radioisotope generators, radiopharmaceutical chemistry, nuclear medicine, or other relevant industry experience” and that “[a]dditional graduate education could substitute for professional experience, and significant experience in the field could substitute for formal education.” Pet. 2–3 (citing Ex. 1002 ¶ 33; Ex. 1019 ¶ 27). At this stage of the proceeding, Patent Owner does not dispute Petitioner’s proposed definition nor provide a proposed definition of its own. See generally Prelim. Resp. For the purposes of this Decision, we adopt Petitioner’s undisputed proposed definition of a POSITA.” slip op. at 10
Claim construction§ 102 anticipation§ 103 obviousness§ 112 disclosurecites PhillipsPatents in suitUS 12,249,437 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentablePTAB · Oct 23, 2025 · IPR2024-00790 · APJ Jo-Anne M Kokoski · IPR · Final written decision
Claims 1–3 are unpatentable as obvious over Kim; claims 4 and 5 were not shown unpatentable over the asserted grounds.
RulingsFinal written decision- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner
“SuperGuide, 358 F.3d at 875 (“We review the patent’s written description and drawings to confirm that the patentee’s own use of the disputed term is consistent with the meaning given to it by the court.”). The ’031 patent teaches that dielectric pairs of different tiers are etched to form staircases extending along the x-y plane. Ex. 1001, 13:27–28. As described above (§ I.D, supra), dielectric filling structure 311 is formed by depositing a dielectric filling material to fill the space remaining after portions of dielectric stack 203 are removed to form staircase structure 303. Id. at 13:36–41; see also id. at 22:63–65 (“Memory structure 1200 can be formed by forming dielectric filling structure 1201 to fill the space formed by the removal of portions of dielectric stack 1003.”) The ’031 patent then teaches that excess dielectric filling material overlying the topmost surface of staircase structure 303 is removed using a suitable planarization method. Id. at 13:41–44; see also 22:67–23:5 (performing a planarization process to remove excess dielectric filling structure 1201 over the top surface of memory structure 1200). According to the ’031 patent, the portion of the deposited dielectric filling material that remains “over staircase structure 303 and isolation layer 109” forms “dielectric filling structure 311 that surrounds staircase structure 303.” Id. at 13:44–48 (emphasis added); see also id. at 1:56–58 (stating in “some embodiments, the memory device also includes a filling structure surrounding the multiple-stack staircase structure”). structure is etched along the x-, y-, and z-axes, and the dielectric filling structure fills the spaces in the x-, y-, and z-directions created when the staircase structure is etched. Because the excess portion of the dielectric filling structure overlying the top of the staircase structure is removed, what remains is dielectric filling structure in the spaces around the staircase structure in the x-, y-, and z-planes. In this way, the ’031 patent teaches that the dielectric filling structure surrounds, i.e., is all around or encircles, the staircase structure.” slip op. at 11
- Skill levelSkill level petitioner adoptedDecided for petitioner
“(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices,” or “an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 22–23. Petitioner further contends that a “POSITA would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. at 23 (citing Ex. 1003 ¶¶ 41–44). Patent Owner states that it does not object to the definition of a POSITA proffered by Petitioner. PO Resp. 13–14 (citing Pet. 22). In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 7. Because Petitioner’s definition of the level of skill in the art is consistent with the ’031 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir 2001).” slip op. at 7
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation not foundMixed
“Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23
- Obviousness (§103) › Motivation to combine / reasonable expectation of success › HindsightNot shown unpatentableDecided for patent owner
“Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23
Patent outcomesUS 10,868,031 mixedClaim construction§ 103 obviousnesscites PhillipsPatents in suitUS 10,868,031 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentablePTAB · Oct 22, 2025 · IPR2024-00794 · APJ Michael T Cygan · IPR · Final written decision
Claims 1 and 6 are unpatentable over Park; claims 2–5 and 7–11 were not shown unpatentable on the asserted grounds.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor’s degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 19 (citing Ex. 1003 ¶¶ 36–37). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not object to this assessment, arguing that its claims are valid regardless of the precise definition. PO 3 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. skill, as it appears to be consistent with the specification of the ’623 patent and the prior art of record.” slip op. at 5
- Expert testimonyPetitioner expert discountedMixed
“the Petition, Petitioner’s approach to Shibata’s drive circuit and Park’s dummy channel/open region teachings results in a deficiency in its showing of reasonable expectation of success for its expressed combination of extending Park’s insulative trenches to replace some of its common source lines. Petitioner relies solely on the fact that the references are capable of performing the relied-upon functions or could possess the relied-upon structure. See, e.g., Pet. Reply 19–20 (stating, “If Shibata accommodates this type of trench . . . there is no reason Park cannot as well,” and “Park itself already presents a variety of ways to minimize any etching problem that may be encountered when using wet etching”). But Park does not describe its dummy channel or open region teachings as generally applicable to all of its embodiments. And Petitioner needs to show a reason why the application of Shibata would be reasonably expected to have been successfully applied in Park, not merely state that there is “no reason” to expect that it would not be successful. See DSS Tech. Mgmt., Inc. v. Apple Inc., 885 F.3d 1367, 1377 (Fed. Cir. 2018) (finding that even where two structures have “the same physical structure,” applying the teachings of one structure to the other requires “additional, reasoned analysis.”). The knowledge of one skilled in the art cannot bridge this gap, because these are inventive features of Park and Shibata. Furthermore, Petitioner also has not sufficiently explained, for any of its proposed augmentations, how metal gate deposition would occur sufficiently in the most remote regions of the long, parallel insulating layers in Petitioner’s Park-Shibata combination of such regions to avoid the risk of incomplete gate electrode layers in the final memory device that Patent Owner argues would result in a significant trade-off in memory device accuracy, and device scalability. PO Resp. 68 (citing Ex. 2010 ¶ 145). For example, Dr. Lee addresses only etching issues, not deposition issues. Ex. 1025, ¶¶ 32–47.” slip op. at 46
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed petitioner constructionDecided for petitioner
“We agree with Petitioner. As pointed out by Patent Owner, the “trenches formed in the BSG” language of claim 1 reflects specific description of the gate-first method of manufacturing, but not the gate-last method of manufacturing. Ex. 1001, 7:17–19 (“referring to Fig. 1A, one or more first dielectric trenches . . . are formed in the one or more BSGs”). However, as Petitioner points out, the claims are to a memory “device,” not to a method of manufacturing or a device produced by specific manufacturing steps. Pet. Reply 1. During prosecution of the application that matured into the ’623 patent, the Examiner determined that the device of claim 1 was distinct from a separately claimed method of manufacturing and The Examiner’s requirement stated that the memory device of claim 1 is not limited by the disclosed process of manufacture because “the process claims require . . . deposition steps of polysilicon whereas the product claims do not require any polysilicon.” Id. Applicant agreed “without traverse” with the Examiner’s determination and selected to pursue only the “device” claims. Id. at 596 (“Applicant elects, without traverse, Invention I, Claims 1–11, drawn to a device”).4 The distinctiveness is also supported by the discussion in the ’623 patent of “formed in the BSG” that describes its device separately from its method of formation. The ’623 patent describes that “[i]n the disclosed memory device, one or more first dielectric trenches are formed in the BSG and extend in a length direction of the substrate to separate the BSG into a plurality of sub-BSGs.” Ex. 1001, 2:25–28. This description precedes, and is separate from, its description of an aspect of a process for manufacturing a memory device in which the BSG layer is formed and then “dielectric trenches are formed” that may “pass through the BSG layer” so that the “BSG layer is separated by the one or more first dielectric trenches into a plurality of sub-BSG layers.” Id. at 3:30–45. The description of the device having trenches formed in the BSG, which is not limited to a particular manufacturing process, further supports Petitioner’s contention that the “formed in the BSG” language is not limited to a particular manufacturing embodiment.” slip op. at 7
- Claim Construction › Intrinsic evidence (Phillips canons) › Specification disavowal / 'present invention' languageTerm construed board ownDecided for patent owner
“We do not agree that such arguments support Patent Owner’s conclusion. Patent Owner acknowledges that two portions of a BSG that are connected at a small opening are not separated because both portions remain electrically connected to each other. Id. at 17 (stating, “common source regions 52a is merely in the middle of a single sub-BSG 2 (‘SUB-BLK2’) and does not divide it into further sub-BSGs because there is an H-cut 72 that connects the two sides of the common source region such that both regions are part of the same sub-BSG”) (citing Ex. 1001, 9:15–19, 9:41–44) (emphasis omitted); Ex. 1026, 34:4–15, 41:23–42:16 (Dr. Kuhn attesting that common source regions may isolate adjacent BSGs). Patent Owner considers other portions of the BSG to be separated into sub-BSGs because there is no such connection between the sub-BSG portions. Id. at 17–18 (annotating Ex. 1001, Fig. 1B). Under such reasoning, the addition of a trench closing a gap between two neighboring BSG portions, thereby breaking the electrical connection therebetween, would “separate” the two BSG portions into further sub-BSGs. In its obviousness assertions, Petitioner argues for such an interpretation of the claim. See Pet. Reply 10 (“Park’s layers 111 electrically separate its BSG”). Based on the above, we determine that the phrase “dielectric trenches formed in the BSG and extending in a length direction of the substrate to perform electrical separation between sub-BSGs, but does not require that the trenches act alone, extending from one end of the device to the other across the entire BSG. Similarly, the trenches need not have any particular length, and need only to have some length that performs that separation.” slip op. at 13
Patent outcomesUS 10,950,623 mixedClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,950,623 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Oct 7, 2025 · IPR2024-00795 · APJ Michael T Cygan · IPR · Final written decision
Claims 1–9 and 11–19 are unpatentable as obvious over Lee or Zhao and Lee; the Board did not find claims unpatentable over Zhao or Yang alone.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time would have had a bachelor’s degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND memory devices (including issues relating to the operation, e.g., programming, of said devices), or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience). Pet. 18 (citing Ex. 1003 ¶¶ 35–38). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about NAND memory’s structure, its component parts, how it operates, and how it is controlled. Id. (citing Ex. 1003 ¶ 38). Patent Owner does not object to this assertion. PO Resp. 12. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’822 patent and the prior art of record.” slip op. at 6
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached
“1. Word line pre-pulse signal Patent Owner argues that such a signal “must increase in value and then decrease in value (or vice versa).” PO Resp. 13; PO Sur-Reply 1. Petitioner agrees with this construction. Pet. Reply. 3. Patent Owner further argues that the pre-pulse signal “prepares the word line before the programming step.” PO Resp. 13. We agree that Petitioner applies its teachings with the same understanding of “pre-pulse signal” as Patent Owner. See, e.g., Pet. 38–39 (asserting that Lee teaches, or that that Lee would make obvious, pre-bias signals applied as pulses). Because both parties agree that a pre-pulse signal “must increase in value and then decrease in value (or vice versa),” and apply this construction in their assertions and arguments, no dispute as to the meaning of this phrase exists in a manner that would affect the outcome of this decision. Therefore, we do not need to determine a particular construction. Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (“[W]e need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy.’” (quoting Vivid Techs., Inc. v. Am. Sci & Eng'g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))).” slip op. at 7
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner
“with the plain language of the claims, each claim states “disposed.” Patent Owner provides dictionary definitions for “disposed,” which is described as a verb. See, e.g., Ex. 2016, 3. When described as a verb in these definitions, “disposed” is the action of the actor; i.e., “the chief disposed his attendants in a circle” (Ex. 2019, 3); “She disposed of her estate among her heirs” (Ex. 2018, 3); “disposed of the matter efficiently” (Ex. 2017, 3); “troops disposed for withdrawal” (Ex. 2016, 3). Petitioner offers no contrary definition from either the Specification or any extrinsic source for that term. We agree with Patent Owner’s construction of “disposed” as “put in place” or “arranged in a particular position.” Nevertheless, the construction of “disposed” does not resolve the controversy over the language of claims 2, 3, 12, and 13. The claims recite “are disposed.” For example, claim 2 recites, “wherein the [first through third groups] of the plurality of word lines are disposed in an order of distance from the selected word line.” Under Patent Owner’s construction, this reads as, “wherein the [first through third groups] of the plurality of word lines are arranged in a particular position in an order of distance from the selected word line.” But claim 2 does not recite that the word lines are arranged “based on” the selected word line, or that the arrangement occurs only after a word line is selected, as argued by Patent Owner. We agree with Petitioner that the express language of claim 2 does not recite any limitation as to how or when the groups of word lines are disposed. Both parties point to the same language in the ’822 patent Specification in support of their position: “the word lines disposed between the selected word line and the top select gate TSG can be divided into multiple groups of the word lines.” PO Sur-Reply 2 (citing Pet. Reply 11 requires the recited arrangement to exist, at some point. But we determine that none of claims 2, 3, 12, or 13 require a step of arrangement, or an action to change the arrangement of grouped word lines.” slip op. at 9
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundUnpatentableUnpatentable
“not based on the location of the source or bit lines. Instead, Petitioner relies upon the distance from the selected word line and the drain-side of the string. See Pet. 66 (“the channel length between the drain-side of the string and word line selected for programming would be quite long, resulting in a relatively high channel resistance” (citing Ex. 1003 ¶ 360)). Petitioner asserts that Lee’s application of higher pre-charge voltages to the drain-side word lines “offset the channel resistance effect.” Id. (citing Ex. 1003 ¶ 361). Lee and Zhao both admittedly have “typical memory strings, which are a ‘vertical column’ of memory cells arranged in series between a source side select transistor and a drain side transistor.” PO Resp. 53 (emphasis omitted). Petitioner asserts that applying pre-charging to mitigate program disturb (sought by both Lee and Zhao) relies on the creation of a potential difference to facilitate electron redistribution. Pet. Reply 17–18 (citing Ex. 1004, 1:52–56; Ex. 1005, 17:4–12; Ex. 1021 ¶¶ 72–78). Petitioner asserts that the application of voltage can be performed from either end of the channel so long as it targets the portion of the channel desired to be pre- charged. Id. at 18 (citing Ex. 1021 ¶¶ 77–78; Ex. 1010, 17:16–23). Although Patent Owner points to Yang as showing different “biasing schemes” based upon whether the bit line, source line, or both are used for pre-charging, each of the cited Figures 8–10 of Yang indicates that Vbypass (Yang’s uncontested pre-pulse signal) is applied to at least some word lines between the selected word line and the drain-side SGD0. Ex. 1010, Figs. 8C, 9C, 10C; see PO Resp. 25–28 (“a ‘bypass voltage’ (‘Vbypass’) is applied to ‘not yet programmed’ memory cells during the ‘pre-charge phase’” (citing Fig. 8C) (emphasis omitted)). We do not discern in Patent Owner’s arguments, or in the evidence provided during trial, sufficient reasons why applying voltage from either source or bit line disturbs Petitioner’s asserted advantage of offsetting the resistance of the channel between a selected word line and the drain side of the string. Patent Owner further argues that Lee discusses a “wholly disparate approach” for mitigating program disturb than Zhao and that a POSITA would not have been motivated to apply Lee’s teaching to Zhao. PO Resp. 56–58. Patent Owner contends that because Zhao does not conduct current when applying its bypass voltage to equalize charges, but Lee does conduct current when doing so, Lee need only compensate for insufficient charge boosting due to the increased resistance component between source and drain and does not need to compensate for “resistance” effects creating voltage differences along the length of the memory string channel. Id. at 56. Dr. Przybylski’s supporting testimony is based upon such differences in the resistance components. See, e.g., Ex. 2011 ¶ 128. However, we have credited Dr. Liu’s testimony that a chain of transistors in both systems creates a resistance effect regardless of current flow in the steady state. Supra § II.F.1.b.2. We further agree with Petitioner that applying pre- on the creation of a potential difference to facilitate electron redistribution. Pet. Reply 17–18 (citing Ex. 1004, 1:52–56; Ex. 1005, 17:4–12; Ex. 1021 ¶¶ 72–78). We further credit Dr. Liu’s testimony that Zhao’s use of the same pre-charge voltages to not-yet-programmed word lines presents an issue of inadequate pre-charging that Lee addresses. Ex. 1021 ¶¶ 55–56; Pet. Reply 22–23. Consequently, we are persuaded by Petitioner that the chain resistance effects in Zhao and Lee permit the application of Lee’s method of pre-charging to mitigate program disturb to be applicable and desirable in Zhao’s method of applying pre-charging to mitigate program disturb. Consequently, we determine that Petitioner has shown persuasive motivation for its combination.” slip op. at 45
Patent outcomesUS 11,501,822 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 11,501,822
Holdings, summaries, rulings, issues, outcomes, winners and claim constructions shown for a decision were generated by a large language model reading the opinion. They are a guide to the decision, not the decision. Confirm every one against the court's own text before relying on it. Outcomes read from the patent owner’s side. Party names are extracted from the decision and are missing on about 900 short Director denials and scans, which carry the trial number instead.