• Google LLC / Samsung Electronics Co., Ltd. et al. v. Eyesmatch Ltd.No claims unpatentable
  PTAB · Nov 4, 2025 · IPR2025-00297 · APJ Thomas L Giannetti · IPR · Final written decision

  Claims 1–18 were not shown unpatentable because the prior art did not establish the claimed distance-based variation in the rate of image-processing steps.

  RulingsFinal written decision

  • Prior constructionPrior construction adoptedDecided for patent owner

    “Putting aside the controversy over alleged impropriety and sandbagging in connection with the District Court’s Order, which we address infra in connection with Patent Owner’s Motion to Strike, we find the District Court’s “mirror-mimicking” construction to be well-reasoned and supported by the record, and we therefore adopt that construction and its reasoning. As the District Court points out, both the “double the distance” and “same size” aspects of its construction are expressly discussed in the ’109 patent. See Ex. 2008, 16 (citing Ex. 1001, 2:5–27, Figs. 5A, 5B). So, too, is “flipping” or reversing of the image disclosed. Id. at 17 (citing Ex. 1001, 14:46–51, 15:41–47). Petitioner does not dispute that the ’109 patent discloses these aspects of “mirror-mimicking,” or even that the District Court’s claim construction is incorrect. Instead, Petitioner contends that “[t]he Board need not construe ‘mirror mimicking’ [beyond plain meaning] since the prior art expressly discloses mimicking a mirror.” Pet. Reply 6. Further. Petitioner characterizes the claim construction order as “a report and recommendation” by a magistrate judge that “the district court judge has not evaluated or adopted.” Id. at 6 n.2.9 We address infra whether the prior art “expressly” discloses “mirror- mimicking” as construed by the District Court. We, however, disagree with Petitioner that we should not construe this term. Given the controversy over whether Petitioner has argued for a different construction in the District Court, we cannot agree that an explicit construction of “mirror-mimicking” is an unnecessary step toward resolving this controversy. See Vivid Techs., Inc., 200 F.3d at 803. We therefore adopt the District Court’s construction for “mirror-” slip op. at 16

  • Obviousness (§103) › Motivation to combine / reasonable expectation of success › Teaching awayTeaching away not foundMotivation foundDecided for petitioner

    “We do not agree. Petitioner demonstrates persuasively that a person of ordinary skill would have combined these references “to reduce distortion and provide a realistic mirror image.” Pet. 14–17; Haram Decl. ¶¶ 110–117. We are not persuaded by Patent Owner that by specifically disclosing “flipping” the image, Rosenberg is discouraging or teaching away from performing other transformations to achieve its objective of “replicat[ing] the performance of a standard household mirror.” See PO Resp. 32–33 (Patent Owner asserting lack of motivation to combine the references). A reference may be said to “teach away” “when a person of ordinary skill, upon reading the reference, would be discouraged from following the path set out in the reference, or would be led in a direction divergent from the path that was taken by the applicant.” Galderma Lab'ys, L.P. v. Tolmar, Inc., 737 F.3d 731, 738 (Fed. Cir. 2013). “A reference does not teach away, however, if it merely expresses a general preference for an alternative invention but does not criticize, discredit, or otherwise discourage investigation into the invention claimed. Id. Further, when conducting an obviousness analysis, the Board must consider a prior art reference “not only for what it expressly teaches, but also for what it fairly suggests.” Bradium Techs. LLC v. Iancu, 923 F.3d 1032, 1049 (Fed. Cir. 2019) (quoting In re Baird, 16 F.3d 380, 383 (Fed. Cir. 1994)). We are not convinced that the references before us “teach away” from performing the other transformations.” slip op. at 30

  • Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation not foundNot shown unpatentable
  • Obviousness (§103) › Graham factors (scope of art, differences, level of skill)Not shown unpatentableNot shown unpatentable

  Patent outcomesUS 8,982,109 not shown unpatentable
  Claim construction§ 103 obviousnesscites Phillips
  Patents in suitUS 8,982,109
• Google LLC / Samsung Electronics Co., Ltd. et al. v. Eyesmatch Ltd.No claims unpatentable
  PTAB · Nov 4, 2025 · IPR2024-00856 · APJ Thomas L Giannetti · IPR · Final written decision

  Claims 1–18 were not shown unpatentable because the cited combinations did not teach or suggest varying the rate of the claimed image-processing steps according to user distance.

  RulingsFinal written decision

  • Skill levelSkill level petitioner adoptedDecided for patent owner

    “Patent Owner states that it “applies Petitioners’ proposed level of skill for purposes of this Response.” PO Resp. 14 (citing Forsyth Decl. ¶¶ 62– 63). For this Decision, we adopt the formulation of the level of ordinary skill in the art proposed by Petitioner and applied by Patent Owner as consistent with the prior art before us in this proceeding.7” slip op. at 13

  • Prior constructionPrior construction adoptedDecided for patent owner

    “Putting aside the controversy over alleged impropriety and sandbagging in connection with the District Court’s Order, which we address infra in connection with Patent Owner’s Motion to Strike, we find the District Court’s “mirror-mimicking” construction to be well-reasoned and supported by the record, and we therefore adopt that construction and its reasoning. As the District Court points out, both the “double the distance” and “same size” aspects of its construction are expressly discussed in the ’109 patent. See Ex. 2008, 16 (citing Ex. 1001, 2:5–27, Figs. 5A, 5B). So, too, is “flipping” or reversing of the image disclosed. Id. at 17 (citing Ex. 1001, 14:46–51, 15:41–47). Petitioner does not dispute that the ’109 patent discloses these aspects of “mirror-mimicking,” or even that the District Court’s claim construction is incorrect. Instead, Petitioner contends that “[t]he Board need not construe ‘mirror mimicking’ [beyond plain meaning] since the prior art expressly discloses mimicking a mirror.” Pet. Reply 6. Further. Petitioner characterizes the claim construction order as “a report and recommendation” by a magistrate judge that “the district court judge has not evaluated or adopted.” Id. at 6 n.2.9 We address infra whether the prior art “expressly” discloses “mirror- mimicking” as construed by the District Court. We, however, disagree with Petitioner that we should not construe this term. Given the controversy over whether Petitioner has argued for a different construction in the District Court, we cannot agree that an explicit construction of “mirror-mimicking” is an unnecessary step toward resolving this controversy. See Vivid Techs., Inc., 200 F.3d at 803. We therefore adopt the District Court’s construction for “mirror-” slip op. at 16

  • Obviousness (§103) › Motivation to combine / reasonable expectation of success › Teaching awayTeaching away not foundMotivation foundDecided for petitioner

    “We do not agree. Petitioner demonstrates persuasively that a person of ordinary skill would have combined these references “to reduce distortion and provide a realistic mirror image.” Pet. 14–17; Haram Decl. ¶¶ 110–117. We are not persuaded by Patent Owner that by specifically disclosing “flipping” the image, Rosenberg is discouraging or teaching away from performing other transformations to achieve its objective of “replicat[ing] the performance of a standard household mirror.” See PO Resp. 32–33 (Patent Owner asserting lack of motivation to combine the references). A reference may be said to “teach away” “when a person of ordinary skill, upon reading the reference, would be discouraged from following the path set out in the reference, or would be led in a direction divergent from the path that was taken by the applicant.” Galderma Lab'ys, L.P. v. Tolmar, Inc., 737 F.3d 731, 738 (Fed. Cir. 2013). “A reference does not teach away, however, if it merely expresses a general preference for an alternative invention but does not criticize, discredit, or otherwise discourage investigation into the invention claimed. Id. Further, when conducting an obviousness analysis, the Board must consider a prior art reference “not only for what it expressly teaches, but also for what it fairly suggests.” Bradium Techs. LLC v. Iancu, 923 F.3d 1032, 1049 (Fed. Cir. 2019) (quoting In re Baird, 16 F.3d 380, 383 (Fed. Cir. 1994)). We are not convinced that the references before us “teach away” from performing the other transformations.” slip op. at 30

  • Obviousness (§103) › Motivation to combine / reasonable expectation of successNot shown unpatentableMotivation not foundNot shown unpatentable

    “We find that Petitioner has not demonstrated by a preponderance of evidence that step 1(h) is taught or suggested by the references cited by Petitioner or the testimony of Petitioner’s expert, Dr. Karam. We agree, instead, with Patent Owner’s argument that “a [person of ordinary skill] would regard the disclosures in Rosenberg relating to proximity detection to be in connection with turning on or off various display modes and not in connection with varying the rate of one or more steps that are performed to transform a series of captured images of a user.” PO Resp. 33 (citing Ex.1005, ¶¶ 25, 32, 56, 69, 114). This distinction was explored during the final hearing. Petitioner’s counsel confirmed that in Rosenberg’s mirror mode, the rate of performing the processing steps does not vary: [THE BOARD]: It’s true that when the -- when Rosenberg is acting in the mirror mode, it’s always at the same rate, correct? It’s always performing those three processing steps at the same rate? [COUNSEL]: Correct. Hearing Tr. 34:13–16. We conclude that Rosenberg fails to disclose or suggest step 1(h) for the reasons given by Patent Owner and summarized above. We agree with Patent Owner’s analysis that in Rosenberg, when the mirror is off the processing steps are not performed, and when the mirror is on, the steps are performed “at an invariant rate.” PO Sur-reply 18–19.” slip op. at 33

  Patent outcomesUS 8,982,109 not shown unpatentable
  Claim construction§ 103 obviousnesscites Phillips
  Patents in suitUS 8,982,109
• Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentable
  PTAB · Oct 23, 2025 · IPR2024-00790 · APJ Jo-Anne M Kokoski · IPR · Final written decision

  Claims 1–3 are unpatentable as obvious over Kim; claims 4 and 5 were not shown unpatentable over the asserted grounds.

  RulingsFinal written decision

  • Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner

    “SuperGuide, 358 F.3d at 875 (“We review the patent’s written description and drawings to confirm that the patentee’s own use of the disputed term is consistent with the meaning given to it by the court.”). The ’031 patent teaches that dielectric pairs of different tiers are etched to form staircases extending along the x-y plane. Ex. 1001, 13:27–28. As described above (§ I.D, supra), dielectric filling structure 311 is formed by depositing a dielectric filling material to fill the space remaining after portions of dielectric stack 203 are removed to form staircase structure 303. Id. at 13:36–41; see also id. at 22:63–65 (“Memory structure 1200 can be formed by forming dielectric filling structure 1201 to fill the space formed by the removal of portions of dielectric stack 1003.”) The ’031 patent then teaches that excess dielectric filling material overlying the topmost surface of staircase structure 303 is removed using a suitable planarization method. Id. at 13:41–44; see also 22:67–23:5 (performing a planarization process to remove excess dielectric filling structure 1201 over the top surface of memory structure 1200). According to the ’031 patent, the portion of the deposited dielectric filling material that remains “over staircase structure 303 and isolation layer 109” forms “dielectric filling structure 311 that surrounds staircase structure 303.” Id. at 13:44–48 (emphasis added); see also id. at 1:56–58 (stating in “some embodiments, the memory device also includes a filling structure surrounding the multiple-stack staircase structure”). structure is etched along the x-, y-, and z-axes, and the dielectric filling structure fills the spaces in the x-, y-, and z-directions created when the staircase structure is etched. Because the excess portion of the dielectric filling structure overlying the top of the staircase structure is removed, what remains is dielectric filling structure in the spaces around the staircase structure in the x-, y-, and z-planes. In this way, the ’031 patent teaches that the dielectric filling structure surrounds, i.e., is all around or encircles, the staircase structure.” slip op. at 11

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices,” or “an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 22–23. Petitioner further contends that a “POSITA would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. at 23 (citing Ex. 1003 ¶¶ 41–44). Patent Owner states that it does not object to the definition of a POSITA proffered by Petitioner. PO Resp. 13–14 (citing Pet. 22). In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 7. Because Petitioner’s definition of the level of skill in the art is consistent with the ’031 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir 2001).” slip op. at 7

  • Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation not foundMixed

    “Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23

  • Obviousness (§103) › Motivation to combine / reasonable expectation of success › HindsightNot shown unpatentableDecided for patent owner

    “Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23

  Patent outcomesUS 10,868,031 mixed
  Claim construction§ 103 obviousnesscites Phillips
  Patents in suitUS 10,868,031
• Micron Technology, Inc. v. Yangtze Memory Techonologies Company, Ltd.All claims unpatentable
  PTAB · Oct 23, 2025 · IPR2024-00789 · APJ Jo-Anne M Kokoski · IPR · Final written decision

  Claims 1–6 and 11–13 are unpatentable as obvious over Tessariol; Petitioner did not show claims 1–6, 11, and 13 obvious over Park.

  RulingsFinal written decision

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices,” or “an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 33. Petitioner further contends that a “POSITA would have been aware of and generally knowledgeable about 3D NAND’s structure, how it is manufactured, and its component parts.” Id. (citing Ex. 1003 ¶¶ 40–43). Patent Owner states that it does not object to the definition of a POSITA proffered by Petitioner. PO Resp. 13 (citing Pet. 33). In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 5–6. Because Petitioner’s definition of the level of skill in the art is consistent with the ’872 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir 2001).” slip op. at 6

  • Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner

    “Read as a whole, the Specification supports the conclusion that a “dummy source structure” does not function as a source for the memory cells. Dummy source structures are variously described as being (1) electrically separated from the conductive layers of the memory stack, (2) used to laterally separate 3D memory device 100 into multiple memory regions, (3) used as a mechanical support structure, and (4) used as an interconnect to peripheral devices. None of these functions are directed to sourcing the memory cells. Moreover, the Specification describes a “source structure” as being connected with a channel structure of a memory string via a common source, such as a doped region in the substrate. That a dummy source structure does not function as a source to the memory cells is consistent with this description of source structure.” slip op. at 11

  • Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable

    “After considering the complete record, we are persuaded that Petitioner sufficiently establishes that Tessariol teaches “at least two of the plurality of dummy source structures are of nominally equal lateral distances to the staircase contact” and “the plurality of dummy source structures are of nominally equal lateral distances to the staircase contact” as recited in claims 3 and 4. As an initial matter, we note that the ’872 patent defines “nominal/nominally” as follows: As used herein, the term “nominal/nominally” refers to a desired, or target, value of a characteristic or parameter for a component or a process operation, set during the design phase of a product or a process, together with a range of values above and/or below the desired value. The range of values can be due to slight variations in manufacturing, processes or tolerances. Ex. 1001, 4:9–15. Referring to Figure 1A, the ’872 patent also teaches that “[t]he four dummy source structures indicated by 146 may be spaced with nominally equal lateral distances to staircase contact 122. In other words, the four dummy source structures indicated by 146 may be evenly or Accordingly, we understand “nominally equal lateral distances” as used in claims 3 and 4 to include evenly or uniformly distributed structures. See Ex. 1003 ¶ 162 (Dr. Banerjee testifying that “[n]ominally lateral distances to, in the context of the ’872 Patent, includes being ‘evenly or uniformly distributed.’”). Tessariol’s Figure 15 illustrates that dummy structures 60 are evenly distributed around operating conductive vias 80. Ex. 1006, Fig. 15. The figure is consistent with Tessariol’s teaching that dummy-structure openings 56 (which become dummy structures 60) are “collectively arrayed in straight-line rows and columns” and “any alternate configuration may be used including, for example, staggering . . . alternating openings 54/56 in rows and/or columns.” Id. ¶ 37. We also credit Dr. Banerjee’s testimony that “it is best practice to use repeating patterns in semiconductive designs” and “a POSITA viewing the Tessariol figures would immediately interpret the figures to include this repeating pattern, in which these objects are of equal distance from the contact.” Ex. 1035 ¶ 85. We disagree with Patent Owner that Tessariol’s Figure 15 is insufficient to show that the dummy source structures are of nominally equal lateral distances to the staircase contact. The Federal Circuit has held that “the speculative modeling premised on unstated assumptions in prior art patent drawings cannot be the basis for challenging the validity of claims reciting specific dimensions not disclosed directly in such prior art.” Nystrom v. TREX Co., 424 F.3d 1136, 1148 (Fed. Cir. 2005) (emphasis added). Here, claims 3 and 4 recite relative positioning (“nominally equal lateral distances”), not specific dimensions or proportions. Accordingly, we find Petitioner’s reliance on Tessariol’s Figure 15 to establish the placement particularly given Dr. Banerjee’s credible testimony regarding best practices in semiconductor design and that a POSITA viewing the Tessariol figures would have understood the objects are of equal distance from the contact. See Ex. 1035 ¶ 85. Based on our consideration of the entire record, and for the reasons set forth above, we determine that Petitioner shows, by a preponderance of the evidence, that claims 3 and 4 would have been obvious over the teachings of Tessariol.” slip op. at 27

  • Expert testimonyPetitioner expert discountedDecided for patent owner

    “Petitioner’s and Dr. Banerjee’s arguments are not persuasive. The arguments are circular as they assert that a POSITA would have understood that dummy source structure must have a complete path (i.e., not have a partial path, or dead-end) like a source structure because the source structure must have a complete path. See, e.g., Ex. 1035 ¶ 50. Similarly, the argument that the ’872 patent’s use of “connect” can only refer to an electrical connection between dummy source structure 246 and the channel structures is based on a figure depicting a source line as having an electrical connection and Dr. Banerjee’s unsupported assertion that the source line is a dummy source line (in some embodiments). Pet. Reply 9; Ex. 1035 ¶ 50. Again, Dr. Banerjee’s evidence is circular as it asserts the dummy source structure must have a complete path because the figure depicts a source line having a complete path, and therefore dummy source lines (in some embodiments) must have a complete path. Id. To the extent Dr. Banerjee asserts that it was “well known” that dummy source structures function as sources or source structures, any such assertion is not credible in light of his testimony that he had never heard of dummy source structures. See Ex. 1035 ¶¶ 17 (stating he “never heard of ‘dummy source structure’ before reading the ’872 patent”), 50 (stating “how these dummy source and source structures function as sources . . . was well known”). Thus, Petitioner’s assertion that the ’872 patent teaches a dummy source structure may connect to channel structures in the inner region is insufficient to show that the dummy source structure acts as a source to the memory cells.” slip op. at 14

  Patent outcomesUS 10,861,872 unpatentable
  Claim construction§ 103 obviousnesscites Phillips
  Patents in suitUS 10,861,872
• Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentable
  PTAB · Oct 22, 2025 · IPR2024-00794 · APJ Michael T Cygan · IPR · Final written decision

  Claims 1 and 6 are unpatentable over Park; claims 2–5 and 7–11 were not shown unpatentable on the asserted grounds.

  RulingsFinal written decision

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor’s degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 19 (citing Ex. 1003 ¶¶ 36–37). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not object to this assessment, arguing that its claims are valid regardless of the precise definition. PO 3 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. skill, as it appears to be consistent with the specification of the ’623 patent and the prior art of record.” slip op. at 5

  • Expert testimonyPetitioner expert discountedMixed

    “the Petition, Petitioner’s approach to Shibata’s drive circuit and Park’s dummy channel/open region teachings results in a deficiency in its showing of reasonable expectation of success for its expressed combination of extending Park’s insulative trenches to replace some of its common source lines. Petitioner relies solely on the fact that the references are capable of performing the relied-upon functions or could possess the relied-upon structure. See, e.g., Pet. Reply 19–20 (stating, “If Shibata accommodates this type of trench . . . there is no reason Park cannot as well,” and “Park itself already presents a variety of ways to minimize any etching problem that may be encountered when using wet etching”). But Park does not describe its dummy channel or open region teachings as generally applicable to all of its embodiments. And Petitioner needs to show a reason why the application of Shibata would be reasonably expected to have been successfully applied in Park, not merely state that there is “no reason” to expect that it would not be successful. See DSS Tech. Mgmt., Inc. v. Apple Inc., 885 F.3d 1367, 1377 (Fed. Cir. 2018) (finding that even where two structures have “the same physical structure,” applying the teachings of one structure to the other requires “additional, reasoned analysis.”). The knowledge of one skilled in the art cannot bridge this gap, because these are inventive features of Park and Shibata. Furthermore, Petitioner also has not sufficiently explained, for any of its proposed augmentations, how metal gate deposition would occur sufficiently in the most remote regions of the long, parallel insulating layers in Petitioner’s Park-Shibata combination of such regions to avoid the risk of incomplete gate electrode layers in the final memory device that Patent Owner argues would result in a significant trade-off in memory device accuracy, and device scalability. PO Resp. 68 (citing Ex. 2010 ¶ 145). For example, Dr. Lee addresses only etching issues, not deposition issues. Ex. 1025, ¶¶ 32–47.” slip op. at 46

  • Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed petitioner constructionDecided for petitioner

    “We agree with Petitioner. As pointed out by Patent Owner, the “trenches formed in the BSG” language of claim 1 reflects specific description of the gate-first method of manufacturing, but not the gate-last method of manufacturing. Ex. 1001, 7:17–19 (“referring to Fig. 1A, one or more first dielectric trenches . . . are formed in the one or more BSGs”). However, as Petitioner points out, the claims are to a memory “device,” not to a method of manufacturing or a device produced by specific manufacturing steps. Pet. Reply 1. During prosecution of the application that matured into the ’623 patent, the Examiner determined that the device of claim 1 was distinct from a separately claimed method of manufacturing and The Examiner’s requirement stated that the memory device of claim 1 is not limited by the disclosed process of manufacture because “the process claims require . . . deposition steps of polysilicon whereas the product claims do not require any polysilicon.” Id. Applicant agreed “without traverse” with the Examiner’s determination and selected to pursue only the “device” claims. Id. at 596 (“Applicant elects, without traverse, Invention I, Claims 1–11, drawn to a device”).4 The distinctiveness is also supported by the discussion in the ’623 patent of “formed in the BSG” that describes its device separately from its method of formation. The ’623 patent describes that “[i]n the disclosed memory device, one or more first dielectric trenches are formed in the BSG and extend in a length direction of the substrate to separate the BSG into a plurality of sub-BSGs.” Ex. 1001, 2:25–28. This description precedes, and is separate from, its description of an aspect of a process for manufacturing a memory device in which the BSG layer is formed and then “dielectric trenches are formed” that may “pass through the BSG layer” so that the “BSG layer is separated by the one or more first dielectric trenches into a plurality of sub-BSG layers.” Id. at 3:30–45. The description of the device having trenches formed in the BSG, which is not limited to a particular manufacturing process, further supports Petitioner’s contention that the “formed in the BSG” language is not limited to a particular manufacturing embodiment.” slip op. at 7

  • Claim Construction › Intrinsic evidence (Phillips canons) › Specification disavowal / 'present invention' languageTerm construed board ownDecided for patent owner

    “We do not agree that such arguments support Patent Owner’s conclusion. Patent Owner acknowledges that two portions of a BSG that are connected at a small opening are not separated because both portions remain electrically connected to each other. Id. at 17 (stating, “common source regions 52a is merely in the middle of a single sub-BSG 2 (‘SUB-BLK2’) and does not divide it into further sub-BSGs because there is an H-cut 72 that connects the two sides of the common source region such that both regions are part of the same sub-BSG”) (citing Ex. 1001, 9:15–19, 9:41–44) (emphasis omitted); Ex. 1026, 34:4–15, 41:23–42:16 (Dr. Kuhn attesting that common source regions may isolate adjacent BSGs). Patent Owner considers other portions of the BSG to be separated into sub-BSGs because there is no such connection between the sub-BSG portions. Id. at 17–18 (annotating Ex. 1001, Fig. 1B). Under such reasoning, the addition of a trench closing a gap between two neighboring BSG portions, thereby breaking the electrical connection therebetween, would “separate” the two BSG portions into further sub-BSGs. In its obviousness assertions, Petitioner argues for such an interpretation of the claim. See Pet. Reply 10 (“Park’s layers 111 electrically separate its BSG”). Based on the above, we determine that the phrase “dielectric trenches formed in the BSG and extending in a length direction of the substrate to perform electrical separation between sub-BSGs, but does not require that the trenches act alone, extending from one end of the device to the other across the entire BSG. Similarly, the trenches need not have any particular length, and need only to have some length that performs that separation.” slip op. at 13

  Patent outcomesUS 10,950,623 mixed
  Claim construction§ 103 obviousnesscites Phillips · KSR · Graham
  Patents in suitUS 10,950,623
• Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentable
  PTAB · Oct 7, 2025 · IPR2024-00795 · APJ Michael T Cygan · IPR · Final written decision

  Claims 1–9 and 11–19 are unpatentable as obvious over Lee or Zhao and Lee; the Board did not find claims unpatentable over Zhao or Yang alone.

  RulingsFinal written decision

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time would have had a bachelor’s degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND memory devices (including issues relating to the operation, e.g., programming, of said devices), or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience). Pet. 18 (citing Ex. 1003 ¶¶ 35–38). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about NAND memory’s structure, its component parts, how it operates, and how it is controlled. Id. (citing Ex. 1003 ¶ 38). Patent Owner does not object to this assertion. PO Resp. 12. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’822 patent and the prior art of record.” slip op. at 6

  • Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached

    “1. Word line pre-pulse signal Patent Owner argues that such a signal “must increase in value and then decrease in value (or vice versa).” PO Resp. 13; PO Sur-Reply 1. Petitioner agrees with this construction. Pet. Reply. 3. Patent Owner further argues that the pre-pulse signal “prepares the word line before the programming step.” PO Resp. 13. We agree that Petitioner applies its teachings with the same understanding of “pre-pulse signal” as Patent Owner. See, e.g., Pet. 38–39 (asserting that Lee teaches, or that that Lee would make obvious, pre-bias signals applied as pulses). Because both parties agree that a pre-pulse signal “must increase in value and then decrease in value (or vice versa),” and apply this construction in their assertions and arguments, no dispute as to the meaning of this phrase exists in a manner that would affect the outcome of this decision. Therefore, we do not need to determine a particular construction. Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (“[W]e need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy.’” (quoting Vivid Techs., Inc. v. Am. Sci & Eng'g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))).” slip op. at 7

  • Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner

    “with the plain language of the claims, each claim states “disposed.” Patent Owner provides dictionary definitions for “disposed,” which is described as a verb. See, e.g., Ex. 2016, 3. When described as a verb in these definitions, “disposed” is the action of the actor; i.e., “the chief disposed his attendants in a circle” (Ex. 2019, 3); “She disposed of her estate among her heirs” (Ex. 2018, 3); “disposed of the matter efficiently” (Ex. 2017, 3); “troops disposed for withdrawal” (Ex. 2016, 3). Petitioner offers no contrary definition from either the Specification or any extrinsic source for that term. We agree with Patent Owner’s construction of “disposed” as “put in place” or “arranged in a particular position.” Nevertheless, the construction of “disposed” does not resolve the controversy over the language of claims 2, 3, 12, and 13. The claims recite “are disposed.” For example, claim 2 recites, “wherein the [first through third groups] of the plurality of word lines are disposed in an order of distance from the selected word line.” Under Patent Owner’s construction, this reads as, “wherein the [first through third groups] of the plurality of word lines are arranged in a particular position in an order of distance from the selected word line.” But claim 2 does not recite that the word lines are arranged “based on” the selected word line, or that the arrangement occurs only after a word line is selected, as argued by Patent Owner. We agree with Petitioner that the express language of claim 2 does not recite any limitation as to how or when the groups of word lines are disposed. Both parties point to the same language in the ’822 patent Specification in support of their position: “the word lines disposed between the selected word line and the top select gate TSG can be divided into multiple groups of the word lines.” PO Sur-Reply 2 (citing Pet. Reply 11 requires the recited arrangement to exist, at some point. But we determine that none of claims 2, 3, 12, or 13 require a step of arrangement, or an action to change the arrangement of grouped word lines.” slip op. at 9

  • Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundUnpatentableUnpatentable

    “not based on the location of the source or bit lines. Instead, Petitioner relies upon the distance from the selected word line and the drain-side of the string. See Pet. 66 (“the channel length between the drain-side of the string and word line selected for programming would be quite long, resulting in a relatively high channel resistance” (citing Ex. 1003 ¶ 360)). Petitioner asserts that Lee’s application of higher pre-charge voltages to the drain-side word lines “offset the channel resistance effect.” Id. (citing Ex. 1003 ¶ 361). Lee and Zhao both admittedly have “typical memory strings, which are a ‘vertical column’ of memory cells arranged in series between a source side select transistor and a drain side transistor.” PO Resp. 53 (emphasis omitted). Petitioner asserts that applying pre-charging to mitigate program disturb (sought by both Lee and Zhao) relies on the creation of a potential difference to facilitate electron redistribution. Pet. Reply 17–18 (citing Ex. 1004, 1:52–56; Ex. 1005, 17:4–12; Ex. 1021 ¶¶ 72–78). Petitioner asserts that the application of voltage can be performed from either end of the channel so long as it targets the portion of the channel desired to be pre- charged. Id. at 18 (citing Ex. 1021 ¶¶ 77–78; Ex. 1010, 17:16–23). Although Patent Owner points to Yang as showing different “biasing schemes” based upon whether the bit line, source line, or both are used for pre-charging, each of the cited Figures 8–10 of Yang indicates that Vbypass (Yang’s uncontested pre-pulse signal) is applied to at least some word lines between the selected word line and the drain-side SGD0. Ex. 1010, Figs. 8C, 9C, 10C; see PO Resp. 25–28 (“a ‘bypass voltage’ (‘Vbypass’) is applied to ‘not yet programmed’ memory cells during the ‘pre-charge phase’” (citing Fig. 8C) (emphasis omitted)). We do not discern in Patent Owner’s arguments, or in the evidence provided during trial, sufficient reasons why applying voltage from either source or bit line disturbs Petitioner’s asserted advantage of offsetting the resistance of the channel between a selected word line and the drain side of the string. Patent Owner further argues that Lee discusses a “wholly disparate approach” for mitigating program disturb than Zhao and that a POSITA would not have been motivated to apply Lee’s teaching to Zhao. PO Resp. 56–58. Patent Owner contends that because Zhao does not conduct current when applying its bypass voltage to equalize charges, but Lee does conduct current when doing so, Lee need only compensate for insufficient charge boosting due to the increased resistance component between source and drain and does not need to compensate for “resistance” effects creating voltage differences along the length of the memory string channel. Id. at 56. Dr. Przybylski’s supporting testimony is based upon such differences in the resistance components. See, e.g., Ex. 2011 ¶ 128. However, we have credited Dr. Liu’s testimony that a chain of transistors in both systems creates a resistance effect regardless of current flow in the steady state. Supra § II.F.1.b.2. We further agree with Petitioner that applying pre- on the creation of a potential difference to facilitate electron redistribution. Pet. Reply 17–18 (citing Ex. 1004, 1:52–56; Ex. 1005, 17:4–12; Ex. 1021 ¶¶ 72–78). We further credit Dr. Liu’s testimony that Zhao’s use of the same pre-charge voltages to not-yet-programmed word lines presents an issue of inadequate pre-charging that Lee addresses. Ex. 1021 ¶¶ 55–56; Pet. Reply 22–23. Consequently, we are persuaded by Petitioner that the chain resistance effects in Zhao and Lee permit the application of Lee’s method of pre-charging to mitigate program disturb to be applicable and desirable in Zhao’s method of applying pre-charging to mitigate program disturb. Consequently, we determine that Petitioner has shown persuasive motivation for its combination.” slip op. at 45

  Patent outcomesUS 11,501,822 unpatentable
  Claim construction§ 103 obviousnesscites Phillips · KSR · Graham
  Patents in suitUS 11,501,822
• Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Instituted
  PTAB · Sep 3, 2025 · PGR2025-00021 · APJ Kimberly Mcgraw · PGR · Institution

  The Board instituted PGR on claims 1, 3–7, and 12–20, finding it more likely than not that at least claim 1 would have been obvious over Kim.

  RulingsInstitution decision

  • PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted

    “Institution of a post-grant review is authorized by statute when “the information presented in the petition . . . demonstrate[s] that it is more likely than not that at least 1 of the claims challenged in the petition is unpatentable.” 35 U.S.C. § 324(a) (2018); see also 37 C.F.R. § 42.4 (2023). Post-grant review is available for patents that issue from applications that at one point contained at least one claim with an effective filing date on or after March 16, 2013. See Leahy-Smith America Invents Act, Pub. L. No. 112- 29, 125 Stat. 284 (2011) (“AIA”), §§ 3(n)(1), 6(f)(2)(A). For the reasons discussed below, we determine that Petitioner establishes they are more likely than not to prevail with respect to the unpatentability of at least one of the challenged claims. Accordingly, we institute a post-grant review of claims 1, 3–7, and 12–20 of the ’838 patent.” slip op. at 2

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “II. ANALYSIS A. Level of Ordinary Skill in the Art Petitioner contends that a person of ordinary skill in the art (“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline, along with 2–3 years of professional experience working with (e.g., researching, designing, or teaching) 3D memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may substitute for professional experience).” Pet. 21 (citing Ex. 1003 ¶¶ 36–37). Petitioner further contends that a” slip op. at 5

  • BurdenInstituted

    “(c) Analysis We have reviewed and considered both parties’ arguments and evidence and determine that Petitioner has sufficiently shown that Kim discloses or suggests the limitations of claim 1. We disagree with Patent an “island” shaped landing pad that is surrounded on all four sides by auxiliary layer 122. Based on the present record, we do not understand the Petition to rely solely on the “island” landing pad embodiment of Kim because the Petition also refers to an embodiment in Kim that is not island shaped. See, e.g., Pet. 34–35 (citing, inter alia, Ex. 1005, Fig. 5). In this embodiment, the sides of protrusion pad PAD_P are “coplanar” with 2 of the edges of PAD_B (i.e., E3, E4). See, e.g., Ex. 1005, Fig. 5. We understand that, in this embodiment, PAD_P is not an “island” landing pad because the auxiliary layer would not surround the landing pad on the sides of the landing pad coplanar to edges E3 and E4. See, e.g., Ex. 1005, Fig. 5. Thus, in this embodiment, the asserted first material layer (i.e., insulating layer 110 and the portion of the auxiliary layer to the left of the landing pad) would not form one structure all the way around PAD_P, as contended by Patent Owner. Prelim. Resp. 21 (citing Ex. 2006 ¶ 61). Rather, the asserted first material layer would end as depicted by Petitioner. See, e.g., Pet. 34–35 (citing Ex. 1005, Fig. 4B).” slip op. at 18

  • Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached

    “Patent Owner states that it does not believe any terms require construction. Prelim. Resp. 9. Based on the record before us, we determine that none of the claim terms discussed above require express construction for purposes of this Decision. To the extent the parties’ arguments raise additional claim construction issues, for efficiency, we address any such arguments in the context of our unpatentability analysis below.” slip op. at 7

  Claim construction§ 103 obviousnesscites Phillips
  Patents in suitUS 12,010,838
• Micron Technology, Inc. v. Yangtze Memory Technologies Co., Ltd.Institution denied
  PTAB · Aug 8, 2025 · IPR2025-00244 · APJ Kimberly Mcgraw · IPR · Institution

  The Board denied institution because the petition did not sufficiently show that Costa disclosed or suggested claim 11.H’s required arrangement, and the dependent claims did not cure that deficiency.

  RulingsInstitution decision

  • PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)Institution denied meritsInstitution denied

    “In view of these deficiencies, the Petition fails to identify the proposed grounds for review with particularity as required by 35 U.S.C. § 312(a)(3) with respect to the limitations of independent claim [11.H]. Petitioner presents no arguments or evidence with respect to the dependent claims challenged under this ground that would remedy the defects noted above with respect to independent claim 11. See generally Pet. Thus, Petitioner has failed to demonstrate a reasonable likelihood that the subject matter of claims 11, 12, or 14–19 would have been obvious over Costa.” slip op. at 23

  • BurdenDenied

    “3. Analysis A petition is required to identify “with particularity[ ] the grounds on which the challenge to each claim is based, and the evidence that supports the grounds for the challenge.” 35 U.S.C. § 312(a)(3). The “petition . . . must include . . . [a] full statement of the reasons for the relief requested, including a detailed explanation of the significance of the evidence”). 37 C.F.R. § 42.22(a)(2). Our rules require that a petition include fully developed arguments. See 37 C.F.R. § 42.22(a)(2) (the “petition . . . must include . . . [a] full statement of the reasons for the relief requested, including a detailed explanation of the significance of the evidence”). The petition must include both an adequate explanation of how the claims should be construed as well as how the construed claims are unpatentable over the asserted prior art. 37 C.F.R. § 42.104(b)(3), (b)(4). Additionally, the “petition must specify where each element of the claim is found in the prior art.” 37 C.F.R. § 42.104(b)(4). A petition should also “explain why a person of ordinary skill in the art would have combined elements from specific references in the way the claimed invention does.” ActiveVideo Networks, Inc. v. Verizon Comm'ns, Inc., 694 F.3d 1312, 1328 (Fed. Cir. 2012). Thus, based on our rules, we only consider fully developed arguments set forth in the petition.” slip op. at 16

  • Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITANot reached

    “arguments. See, e.g., id. at 34–35 (arguing that “on” does not require overlap in the Z direction but “includes both objects that are merely touching (in any dimension) and objects that are in proximity to each other but not touching” (citing Ex. 1078, 1; Ex. 1001, 8:3–12)); see also id. at 36–38 (arguing that if “on” is construed to mean “directly on or on with an intermediate feature or layer therebetween,” then Costa’s second stacked layer 232, 242 and third channel structure (173) are “directly on” each other, because their edges are directly touching each other). The Petition, however, does not clearly present any of the claim construction arguments set forth in the Opposition Brief. See Paper 22 (not clearly identifying where the Petition provides the proposed claim construction); see generally Pet.; see also Pet. 33, 43, 56 (arguing “on” does not require “directly on” and permits intermediate layers but not presenting any of the other claim construction arguments set forth in the Opposition Brief). Nor did the Petition provide any particularized argument as to how Costa discloses or suggests a second stacked layer disposed on the third channel structure applying any of the claim constructions proposed in the Opposition Brief. See generally Pet. (presenting no argument that Costa’s second stacked layer 232, 242 is “on” semiconduction portion layer 173 (the asserted third channel structure) because they touch each other as shown above in Petitioner’s annotation of Costa Figure 21A). We will not consider any arguments not sufficiently set forth in the Petition. See 37 C.F.R. § 42.104(b)(3) (“the petition must set forth . . . [h]ow the challenged claim is to be construed”); 37 C.F.R. § 42.104(b)(4) (“the petition must set forth . . . [h]ow the construed claim is unpatentable”).” slip op. at 19

  • Parallel petitionsNot reached

    “Because we determine that Petitioner did not show a reasonable likelihood that it would prevail on the merits, we do not address Patent Owner’s parallel petitions argument.” slip op. at 23

  Claim constructionDiscretionary denialcites Phillips · KSR · Graham
  Patents in suitUS 10,886,291
• Micron Technology, Inc. v. Yangtze Memory Technologies Co., Ltd.Institution denied
  PTAB · Aug 8, 2025 · IPR2025-00245 · APJ Michael T Cygan · IPR · Institution

  Institution was denied because Petitioner did not show a reasonable likelihood that claims 11, 13, and 15–17 would have been obvious over Costa or Costa and Oh.

  RulingsInstitution decision

  • PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)Institution denied meritsInstitution denied

    “§ 42.4(a), we may only institute an inter partes review when “the information presented in the petition . . . and any response . . . shows that there is a reasonable likelihood that the petitioner would prevail with respect to at least 1 of the claims challenged in the petition.” 35 U.S.C. § 314(a); see also 37 C.F.R. § 42.108(c). Based upon our review of the present record, Petitioner has not sufficiently shown a reasonable likelihood it will prevail with respect to at least one of the challenged claims. Accordingly, we do not institute inter partes review.” slip op. at 2

  • Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther

    “Petitioner states that none of the claims require express construction and the claims should receive their plain and ordinary meaning. Pet. 23. Patent Owner argues that no claim construction is necessary for the institution determination, and that the Petition “still fails if the claim term ‘on’ receives its plain and ordinary meaning -- e.g., physically in contact with or directly on top of with intervening objects therebetween.” Prelim. Resp. 20 (citing Ex. 2006 ¶ 66). Although Patent Owner argues that Petitioner has construed “on” as including indirectly on; i.e., where there is no physical contact, the Petition addressed now-disclaimed claim 18, and the Petition does not advance any construction for the remaining claims. See id. at 16–17 (citing Pet. 92; Ex. 1003 ¶ 258). Consequently, we determine that no construction is required to resolve the issues for institution.” slip op. at 7

  • Skill levelSkill level petitioner adoptedOther

    “we consider the level of ordinary skill at the time of filing. 35 U.S.C. § 103; see also Graham v. John Deere Co., 383 U.S. 1, 17 (1966) (discussing pre- AIA obviousness). Petitioner contends that a person of ordinary skill in the art (“POSITA”) would have had “a bachelor’s degree in electrical engineering or a similar discipline, along with 2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace 1 The Leahy-Smith America Invents Act, Pub. L. No. 112-29, 125 Stat. 284 (2011) (“AIA”), amended 35 U.S.C. § 103. The earliest claimed priority date for the ’241 patent is after the effective date of the applicable AIA amendment. See Ex. 1001, (63). Thus, we refer to the AIA version of 35 U.S.C. § 103. 2 Costa, US 2018/001282771 (filed Feb. 28, 2017, published June 28, 2018) (Ex. 1005, “Costa”). 3 Oh, US 2017/0154892 A1 (filed June 10, 2016, published June 1, 2017) (Ex. 1006, “Oh”). some of the professional experience). Pet. 23–24. Petitioner also asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, how it is manufactured, and its component parts.” Id. (citing Ex. 1003 ¶¶ 36–40). Patent Owner does not take a position on the level of ordinary skill in the art. Prelim. Resp. 11; see also Ex. 2006 ¶ 34 (applying Petitioner’s definition of a POSITA to the opinions set forth in the declaration but reserving the right to opine to an alternative level of a POSITA). At this stage of the proceeding, we adopt Petitioner’s definition of a POSITA as it appears consistent with the level of ordinary skill in the art that is reflected by the prior art of record.” slip op. at 6

  • Obviousness (§103) › Graham factors (scope of art, differences, level of skill)Not shown unpatentableNot shown unpatentable

    “We agree with Patent Owner that the Petition fails to sufficiently show that Costa teaches a “second stacked layer disposed on the third channel structure” as required by apparatus claim element [11.E]. The Petition asserts that Costa’s second alternating stack 232, 242 is formed “on the top surface of joint-level material layers.” Pet. 64. However, Costa refers to the term “joint-level material layers” as representing layers 175–177, not the asserted third channel structure 173. Ex. 1005 ¶¶ 166, 178, 184–85; see Ex. 2006 ¶ 77. Thus, under Petitioner’s characterization, which is consistent with Costa, Costa’s second alternating stack is not formed on the third channel structure, but instead, “on the top surface of the joint level material layers” that surround the third channel structure. Because Petitioner has not explained how a second alternating stack on the surface of the joint material layers teaches a second alternating stack disposed on the third channel structure, Petitioner has not met its obviousness burden for limitation [11.E].” slip op. at 11

  Claim construction§ 103 obviousnesscites Phillips · KSR · Graham
  Patents in suitUS 11,482,532
• Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Instituted
  PTAB · Jul 25, 2025 · IPR2025-00228 · APJ Michael T Cygan · IPR · Institution

  The Board instituted IPR on claims 1–18 and all challenged grounds, finding a reasonable likelihood of prevailing on at least one claim based on the Kim grounds.

  RulingsInstitution decision

  • PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted

    “review. See 35 U.S.C. § 314 (2018); 37 C.F.R. § 42.4(a) (2023). The standard for instituting an inter partes review is set forth in 35 U.S.C. § 314(a), which provides that an inter partes review may not be instituted “unless . . . there is a reasonable likelihood that the petitioner would prevail with respect to at least 1 of the claims challenged in the petition.” On June 25, 2025, Patent Owner’s Request for Discretionary Denial was denied. Paper 21. For the reasons discussed below, we determine that Petitioner establishes a reasonable likelihood of prevailing with respect to the unpatentability of at least one claim of the ’276 patent. Accordingly, we institute an inter partes review of claims 1–18 of the ’276 patent under all grounds presented in the Petition.” slip op. at 2

  • Skill levelSkill level petitioner adoptedDecided for petitioner

    “B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 26 (citing Ex. 1003 ¶42). Petitioner further asserts that a POSITA “would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not provide any such assessment in its Preliminary Response. Prelim. Resp. 7 (reserving the right to argue an alternative level if the Board institutes review). For purposes of this Decision, we adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’276 patent and the prior art of record.” slip op. at 6

  • Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther

    “Neither party proposes any express claim construction at this stage of the proceeding. Pet. 25; Prelim. Resp. 8. Based on the record before us, we determine that no claim term requires express construction for purposes of this Decision.” slip op. at 7

  • Obviousness (§103) › Graham factors (scope of art, differences, level of skill)Other

    “Patent Owner argues that Kim’s Figure 22A shows “[a gate stack] 161 to 168 (tan) disposed below a dielectric layer 111-118 (light purple)” rather than “disposing a sacrificial layer over a dielectric layer” as claimed. Prelim. Resp. 12. Petitioner’s assertions are supported by its assertions based upon Kim’s alternate embodiment, in which the bottom-most step has a lower dielectric layer 111 on which the gate stack 161 is disposed. Compare Ex. 1005, Fig. 22A (representing the embodiment of the dielectric layer at the top surface) with Pet. 37 (Petitioner’s altered Figure 17A representing the embodiment in which the dielectric layer is at the top surface). It is true that the gate stack 161 may also be below dielectric layer 112; however, Patent Owner’s alternate manner of viewing the arrangement of layers does not contradict Petitioner’s equally valid description based upon Kim’s dual embodiments. Petitioner sufficiently shows that Kim’s lower steps (or even a single step) teaches deposition of a sacrificial layer (e.g., SC1) over a dielectric layer (e.g., 111). Pet. 36–37. Consequently, we agree that Petitioner has sufficiently shown Kim to teach or suggest limitations [1.PRE]9 and [1.A].10” slip op. at 9

  Claim construction§ 103 obviousnesscites Phillips · KSR · Graham
  Patents in suitUS 11,101,276

Holdings, summaries, rulings, issues, outcomes, winners and claim constructions shown for a decision were generated by a large language model reading the opinion. They are a guide to the decision, not the decision. Confirm every one against the court's own text before relying on it. Outcomes read from the patent owner’s side. Party names are extracted from the decision and are missing on about 900 short Director denials and scans, which carry the trial number instead.