- Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.No claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00791 · APJ Kimberly Mcgraw · IPR · Final written decision
Claims 8, 9, 11, and 12 were not shown unpatentable under §103 over Toyama because the asserted structures did not meet the construed TAC limitation and the proposed modifications lacked adequate motivation.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 27 (citing Ex. 1003 ¶¶ 34–38). Petitioner further contends that a “POSITA would also have been aware of and generally knowledgeable about semiconductor manufacturing and 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not object to Petitioner’s proposed definition (PO Resp. 12), but Patent Owner’s declarant Dr. Yang provides a slightly different definition, stating a POSITA: would have had at least a bachelor’s degree in electrical engineering, materials science, or a similar discipline, along with at least 2 years of professional experience in semiconductor fabrication process integration for memory devices or an equivalent level of knowledge and experience. For example, an experience, or extensive experience may replace some of the educational requirements. Ex. 2004 ¶ 43. Petitioner’s proposed definition appears to be consistent with the cited prior art and the disclosure of the ’806 patent, and we adopt it for purposes of this Decision. We note that our Decision would be the same under either definition of a POSITA.” slip op. at 8
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITAPlain and ordinary meaningDecided for patent owner
“(TACs) extending vertically through the dielectric structure” recited in claim element [8.G] encompasses multiple TACs, each extending through a separate, different dielectric structure, while Patent Owner argues that the phrase requires that the plurality of TACs (i.e., at least two TACs) must extend through the same dielectric structure. See, e.g., Pet. 49–50; PO Resp. 18–21; Reply 2–4. In our Decision on Institution, we preliminarily construed this phrase to require that more than one (i.e., a plurality) TAC in the TAC region extends vertically through a single dielectric structure. See Inst. Dec. 17. Based upon a full record, we construe this term of claim element [8.G.iii] (i.e., “ . . . a through array contact (TAC) region formed between the first and second channel regions, wherein the TAC region comprises a plurality of through array contacts (TACs) extending vertically through the dielectric structure”) according to its plain language to require that a plurality (i.e., more than one) of TACs must extend vertically through a (i.e., at least one) dielectric structure. Under this construction, the plurality of TACs may extend through more than one dielectric structure, but the plurality of TACs must extend through at least one dielectric structure. The plain language of the claim is not satisfied if each TAC extends through a separate dielectric structure because, in this scenario, there is not a plurality of TACs that extend through a dielectric structure.” slip op. at 10
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation not foundNot shown unpatentableNot shown unpatentable
“Resp. 31–33. Patent Owner persuasively explains, with supporting testimony by Dr. Yang, that these regions containing the interconnects and peripheral circuitry would prevent repeating the layout in the hd1 direction because the interconnects and peripheral circuitry would be located in the same region that Petitioner proposes adding the additional memory plane. Id. (citing Ex. 2004 ¶ 72). Patent Owner further persuasively explains that Toyama teaches repeating the layout in the hd2 direction, not the hd1 direction, because of the location of its interconnects and peripheral circuitry, which prevents repeating the structure in the hd1 direction. See id. at 34 (citing Ex. 1005, Figures 17E, 17F). Patent Owner persuasively explains that Toyama Figure 17F (which is an alternate view of the structure shown in Figure 17E) shows that the memory array has interconnects and driver circuits on at least the left side, which means that in a modification adding additional planes, each plane would necessarily include these interconnects and driver circuitry on the left side. Id. at 35 (citing Ex. 2004 ¶ 75). We agree with Patent Owner that Petitioner has not sufficiently shown that it would have been obvious for a POSITA to repeat the structure shown in Figure 17E in the hd1 direction due to the presence of its interconnects and peripheral circuitry.” slip op. at 34
Patent outcomesUS 10,937,806 not shown unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,937,806 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00909 · APJ Michael T Cygan · IPR · Final written decision
Claims 1–7 and 18 are unpatentable as obvious over Toyama, based on the First Exemplary Structure and, for some limitations, the Second Modification.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“B. Level of Ordinary Skill in the Art Petitioner asserts that a person of ordinary skill in the art (“POSITA”) at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND 2 We apply AIA 35 U.S.C. §§ 102, 103 to the ’378 patent because it was filed after, and never claimed the benefit of an effective filing date before, March 16, 2013. Petitioner also applies AIA §§ 102 and 103. See Pet. 2, 24–26. 3 Neither party presents evidence or arguments regarding objective evidence of non-obviousness. Pet. 104; PO Resp. experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 33 (citing Ex. 1003 ¶¶ 37–39). Petitioner further asserts that a POSITA “would also have been aware of and generally knowledgeable about semiconductor manufacturing and 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. Patent Owner does not object to such a definition. PO Resp. 13. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the Specification of the ’378 patent and the prior art of record.” slip op. at 5
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached
“Petitioner asserts that only the term “a staircase structure in the alternating layer” should be construed, and that the term should be construed as “a staircase structure in the alternating layer stack.” Pet. 32–33. Patent Owner does not dispute this construction, and our determination would be unaffected by Petitioner’s proposed construction. Therefore, we need not provide an express construction of this term. See Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (noting that “we need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy’” (quoting Vivid Techs., Petitioner asserted that all other terms should receive their plain and ordinary meaning. Pet. 33.” slip op. at 6
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITAPlain and ordinary meaningDecided for petitioner
“Because neither the language of claim 15 nor the Specification indicates a narrower meaning, we agree with Petitioner that the phrase “a substrate with an isolation structure” should be given its plain meaning. Patent Owner argues that the plain meaning of “with” is “having” or “inclusive of.” PO Sur-reply 2 (citing Ex. 1038, 8). Citing the same dictionary, Petitioner argues that the plain meaning of “with” includes objects that are separate. Pet. Reply 3 (stating, “In the sentence ‘Alice went to school with Bob,’ it would be nonsensical to interpret that to mean that Bob is part of Alice.”) (citing Ex. 1038, 7). The cited definition of “with” states that it may indicate “accompaniment,” such as “went there [with] her,” as well as combination (“milk [with] honey”). Ex. 1038, 7. Based on the evidence and arguments presented, we determine that the phrase “a substrate with an isolation structure” should be given its plain meaning, which includes accompaniment (A is accompanied by B) as well as combination (A is part of B, or A and B are a part of C).4” slip op. at 9
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“We are persuaded by Petitioner that the lower volume of Toyama’s dielectric fill portion teaches the isolation structure and the upper volume of Toyama’s dielectric fill portion teaches the dielectric structure. First, the structure may be the same material; i.e., SiO2. Ex. 1001, 10:37–40 (isolation structure 233 filled with SiO2), 10:46–47 (dielectric structure can include SiO2, and can include the same material as dielectric layer 230), 10:12–14 (dielectric layer 230 is formed of SiO2). Second, the ’378 patent indicates that the dielectric structure may be “aligned to” and “in contact with” the isolation structure. Id. at 10:30–36. Thus, the two structures of the ’378 patent may appear as two aligned and contacting structures; e.g., a single column of the same material. Third, the ’378 patent specification describes that the dielectric structure and a top portion of the isolation structure may be formed in the same deposition step. When etching the opening 600 that is to be filled with dielectric structure 232, “opening 600 may extend partially into STI structure 233;” i.e., “the etch process used to form opening 600 may also remove (recess) portion of the top surface of STI structure 233.” Id. at 15:12–20; Fig. 6. Then, “opening 600 can be filled with a dielectric layer 702,” which may be the same SiO2 material as the isolation structure, and “[a]s a result, dielectric structure 232 is formed.” Id. at 15:42–54. Thus, the ’378 patent describes a dielectric structure that partially replaces or re-forms, with the same material, its isolation structure. The ’378 patent does not mention whether this results in a dielectric structure that extends into the isolation structure or an isolation structure re-filled to its original height, and it would not appear to matter because both structures may be composed of the same material. The ’378 patent’s indifference to the exact boundary between dielectric structure 232 and isolation structure 233 during formation from the same material indicates that these structures need not be taught by distinct elements. applicable only if the ’378 patent describes that the isolation region and dielectric structure were formed as a single unitary structure. PO Resp. 51; PO Sur-reply 16–18. Retractable Techs. focuses on whether the two elements at issue “could be formed as an integral structure in the first instance,” not whether they were formed integrally. Retractable Techs., 653 F.3d at 1304 (“The specifications further disclose a method to couple the two structures . . . to allow some diffusion or insipient melting to occur where they touch . . . . This passage suggests that [the structures] could be formed as an integral structure in the first instance”). Retractable Techs. looks to whether the specification suggests that the claim terms require separate structures. Powell v. Home Depot U.S.A., Inc., 663 F.3d 1221, 1232 (Fed. Cir. 2011). Patent Owner’s focus on whether the claimed structures were disclosed as being separately formed disregards the issue of whether the separately claimed structures require specific methods of forming those structures. Here, as in Retractable Techs. and Powell, the Specification does not indicate any particular structure or function for the structures that results from their separate steps of deposition. Thus, as held in Retractable Techs. and Powell, the two portions of Toyama “need not be two separate parts” to teach two separate claim limitations. Retractable Techs., 635 F.3d at 1303–04. Consequently, we determine that the claim language does not support a requirement that these structures be separate and distinct. Patent Owner’s further arguments are not availing. Contrary to Patent Owner’s argument, in our “Third” point, supra, we do not state that the isolation structure and the dielectric structure are formed in the same deposition step. PO Resp. 52–53; PO Sur-reply 18; Supra at 34. We only” slip op. at 33
Patent outcomesUS 10,658,378 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,658,378 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.All claims unpatentablePTAB · Jan 5, 2026 · IPR2024-00788 · APJ Michael T Cygan · IPR · Final written decision
Claims 15–17, 19, and 20 are unpatentable as obvious over Toyama, Mushiga, and Mushiga with Makala.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“at the critical time “would have had a bachelor of science degree in electrical engineering or a similar discipline, along with 2-3 years of professional experience working with (e.g., researching, designing, or teaching) NAND flash memory devices, or an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 27 (citing Ex. 1003 ¶¶ 36–37). Petitioner further asserts March 16, 2013. Petitioner also applies AIA §§ 102 and 103. See Pet. 2, 24–26. 3 Neither party presented evidence or arguments regarding objective evidence of non-obviousness during trial. knowledgeable about semiconductor manufacturing and 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. (emphasis omitted). Patent Owner does not object to this assessment. PO Resp. 12. We adopt Petitioner’s proposed level of ordinary skill, as it appears to be consistent with the specification of the ’378 patent and the prior art of record.” slip op. at 5
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededNot reached
“Petitioner does not dispute Patent Owner’s construction, asserting that its grounds render obvious this limitation under Patent Owner’s construction propose construction of the term “through array contact,” which was at issue in the Preliminary Response and in the parallel district court proceeding. Id. Nor have the parties indicated, in response to Board inquiry, that any relevant construction has occurred. See Paper 34. with Petitioner that Patent Owner does not dispute this aspect of the “a dielectric structure on the isolation structure” limitation in Petitioner’s assertions based on Toyama. PO Sur-reply 20–21. Patent Owner does dispute that Mushiga’s insulating spacer 586 is “on” the isolation structure. PO Resp. 70–72. However, because Petitioner relies upon a dielectric structure that includes other portions of Mushiga that Patent Owner does not dispute to be on the asserted isolation structure, the dispute is whether Petitioner is correct to include multiple components as part of a single dielectric structure, and not whether spacer 586 is on an isolation structure. Id. Because Petitioner’s assertions and our determination would be unaffected by its proposed construction, we need not construe this term. See Nidec Motor Corp. v. Zhongshan Broad Ocean Motor Co., 868 F.3d 1013, 1017 (Fed. Cir. 2017) (noting that “we need only construe terms ‘that are in controversy, and only to the extent necessary to resolve the controversy’” (quoting Vivid Techs., Inc. v. Am. Sci. & Eng’g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))).” slip op. at 7
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITAPlain and ordinary meaningDecided for petitioner
“Patent Owner’s citations to the Specification do not support its proposed construction. Patent Owner relies on multiple embodiments, only one of which describes a substrate “with” an isolation structure. PO Resp. 21 (citing Ex. 1001, 22:27–28). For example, one of Patent Owner’s cited embodiments recites “on” an isolation region, but Patent Owner specifically argues that the “on” embodiment does not apply to the claimed “with” embodiment. Id. at 22 (denying that “the ‘with’ relationship encompasse[s] the ‘on’ relationship”). Only one of the embodiments cited is clearly within the scope of the “with” claim language, and that embodiment describes no more than the claim language itself. Ex. 1001, 22:27–28. Moreover, Figure 2, cited by Patent Owner, is an illustration “according to some embodiments,” but is not described as depicting all embodiments. Ex. 1001, 3:35–36. These other embodiments need not be included in claim 15’s “with” language because other claims (not at issue in this proceeding) specifically recite language from other embodiments. Ex. 1001, 23:20–21 (“a dielectric structure on an isolation region of the substrate”), 23:58 (“forming an isolation structure on a substrate”). Thus, the specification of the ’378 patent does not limit “a substrate with an isolation structure” in claim 15 to “part of” an isolation structure, such as in a shallow region or other partial-depth portion of the substrate. Because neither the language of claim 15 nor the Specification indicates a narrower meaning, we agree with Petitioner that the phrase “a Patent Owner argues that the plain meaning of “with” is “having” or “inclusive of.” PO Sur-reply 2 (citing Ex. 1038, 7). Citing the same dictionary, Petitioner argues that the plain meaning of “with” includes objects that are separate. Pet. Reply 3 (stating, “In the sentence ‘Alice went to school with Bob,’ it would be nonsensical to interpret that to mean that Bob is part of Alice.”) (citing Ex. 1038, 7). The cited definition of “with” states that it may indicate “accompaniment,” such as “went there [with] her,” as well as combination (“milk [with] honey”). Ex. 1038, 7. Based on the evidence and arguments presented, we determine that the phrase “a substrate with an isolation structure” should be given its plain meaning, which includes accompaniment (A is accompanied by B) as well as combination (A is part of B, or A and B are a part of C).” slip op. at 9
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“We are persuaded by Petitioner that the lower volume of Toyama’s dielectric fill portion teaches the isolation structure and the upper volume of Toyama’s dielectric fill portion teaches the dielectric structure. First, the ’378 patent indicates that both the dielectric structure and the isolation structure may be the same material; i.e., SiO2. Ex. 1001, 10:37–40 (isolation structure 233 filled with SiO2), 10:46–47 (dielectric structure can include SiO2, and can include the same material as dielectric layer 230), 10:12–14 (dielectric layer 230 is formed of SiO2). Second, the ’378 patent indicates that the dielectric structure may be “aligned to” and “in contact with” the isolation structure. Id. at 10:30–36. Thus, the two structures of the ’378 patent may appear as two aligned and contacting structures; e.g., a single column, of the same material. Third, the ’378 patent specification describes that the dielectric structure and a top portion of the isolation structure may be formed in the same deposition step. When etching the opening 600 that is to be filled with dielectric structure 232, “opening 600 may extend partially into STI structure 233;” i.e., “the etch process used to form opening 600 may also remove (recess) portion of the top surface of STI structure 233.” Id. at 15:12–20. Then, “opening 600 can be filled with a dielectric layer 702,” which may be the same SiO2 material as the isolation structure, and “[a]s a result, dielectric structure 232 is formed.” Id. at 15:42–54. Thus, the ’378 patent describes a dielectric structure that partially replaces or re-forms, with the same material, its isolation structure. The ’378 patent does not mention whether this results in a dielectric structure that extends into the isolation structure or an isolation structure re-filled to its original height, and it would material. The ’378 patent’s indifference to the exact boundary between dielectric structure 232 and isolation structure 233 during formation from the same material indicates that these need not be taught by distinct elements. We do not agree with Patent Owner that Retractable Techs. is applicable only if the ’378 patent describes that the isolation region and dielectric structure were formed as a single unitary structure. PO Resp. 50; PO Sur-reply 9. Retractable Techs. focuses on whether the two elements at issue “could be formed as an integral structure in the first instance,” not whether they were formed integrally. Retractable Techs., 653 F.3d at 1304. (“The specifications further disclose a method to couple the two structures . . . to allow some diffusion or insipient melting to occur where they touch . . . . This passage suggests that [the structures] could be formed as an integral structure in the first instance”). Retractable Techs. looks to whether the specification suggests that the claim terms require separate structures. Powell v. Home Depot U.S.A., Inc., 663 F.3d 1221, 1232 (Fed. Cir. 2011). Patent Owner’s focus on whether the claimed structures were disclosed as being separately formed disregards the issue of whether the separately claimed structures require specific methods of forming those structures. Here, as in Retractable Techs. and Powell, the Specification does not indicate any particular structure or function for the structures that results from their separate steps of deposition. Thus, as held in Retractable Techs. and Powell, the two portions of Toyama “need not be two separate parts” to teach two separate claim limitations. Retractable Techs., 635 F.3d at 1303– 04. Consequently, we determine that the claim language does not support a requirement that these structures be separate and distinct.” slip op. at 32
Patent outcomesUS 10,658,378 unpatentableClaim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 10,658,378 - PTAB · Dec 12, 2025 · IPR2025-01116 · APJ Christopher M Kaiser · IPR · Institution
The Board instituted IPR of claims 1–15 on all asserted grounds, finding a reasonable likelihood that claim 1 would have been obvious over Sudre, Lee, and Penven.
RulingsInstitution decision- PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted
“determine whether to institute an inter partes review under 35 U.S.C. § 314 and 37 C.F.R. § 42.4(a). Inter partes review may not be instituted unless “the information presented in the petition filed under [35 U.S.C.] section 311 and any response filed under [35 U.S.C.] section 313 shows that there is a reasonable likelihood that the petitioner would prevail with respect to at least 1 of the claims challenged in the petition.” 35 U.S.C. § 314(a). “When instituting inter partes review, the Board will authorize the review to proceed on all of the challenged claims and on all grounds of unpatentability asserted for each claim.” 37 C.F.R. § 42.108(a) (2023). In other words, a decision to institute under § 314 may not institute on fewer than all claims challenged in the petition. SAS Inst., Inc. v. Iancu, 138 S. Ct. 1348, 1359–60 (2018). In addition, if the Board institutes trial, it will “institute . . . on all grounds in the petition.” PTAB Consolidated Trial Practice Guide, 5–6 (Nov. 2019)1 (“CTPG”); see also PGS Geophysical AS v. Iancu, 891 F.3d 1354, 1360 (Fed. Cir. 2018) (interpreting the statute to require “a simple yes-” slip op. at 2
- Skill levelSkill level petitioner adoptedDecided for petitioner
“had at least (1) a Bachelor’s Degree (or higher) in material science, materials engineering, mechanical engineering, textile engineering, or a related field, and (2) a minimum of two years of working experience in textiles engineering, fibers and textiles manufacturing, or a related field.” Pet. 4 (citing Ex. 1003 ¶¶ 21–22). Petitioner also argues that “[a]dditional education could substitute for professional experience, and vice versa.” Id. On the present record, Patent Owner does not contest Petitioner’s proposed level of ordinary skill. Prelim. Resp. 25–26. For purposes of this Decision, we adopt Petitioner’s assessment of the level of ordinary skill in the art, as it appears consistent with the ’566 patent and the asserted prior art. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir. 2001).” slip op. at 9
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“Both parties argue that no claim terms require express construction at this stage of the proceeding. Pet. 3; Prelim. Resp. 26. On the present record, we agree. See Realtime Data, LLC v. Iancu, 912 F.3d 1368, 1375 (Fed. Cir. 2019) (“The Board is required to construe ‘only those terms . . . that are in controversy, and only to the extent necessary to resolve the controversy.’” (quoting Vivid Techs., Inc. v. Am. Sci. & Eng’g, Inc., 200 F.3d 795, 803 (Fed. Cir. 1999))). To the extent the parties’ arguments regarding unpatentability do address claim construction issues, we address these issues below.” slip op. at 10
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation foundDecided for petitioner
“articulated a reason why a person of ordinary skill in the art would have combined the teachings of Sudre, Lee, and Penven. Prelim. Resp. 60–63. In particular, Patent Owner argues that a person of ordinary skill in the art “would not have been motivated to look into Penven to modify the teachings of Lee because Lee and Penven disclose substantially different structures.” Id. at 60–61. This argument does not address Petitioner’s proposed reason to combine, which looks to Lee and Penven each to modify Sudre, not to Penven to modify Lee. See Pet. 79–81. In addition, “[c]ombining the teachings of references does not involve an ability to combine their specific structures.” In re Nievelt, 482 F.2d 965, 968 (CCPA 1973). In other words, “[t]he test for obviousness is not whether the features of a secondary reference may be bodily incorporated into the structure of the primary reference . . . . Rather, the test is what the combined teachings of the references would have suggested to those of ordinary skill in the art.” In re Keller, 642 F.2d 413, 425–26 (CCPA 1981). Petitioner provides “some articulated reasoning with some rational underpinning” to combine the teachings of Sudre with those of Lee and Penven. KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 418 (2007). In particular, Petitioner directs us to Sudre’s teaching of “a method for manufacturing PMC,” to Sudre’s lack of teaching of “specific parameters, such as warp thread size and spacing” to satisfy the “particular requirements” of its fabric. Pet. 79 (citing Ex. 1003 ¶¶ 248–250; Ex. 1004, 1:2–5, 6:14–17). As Petitioner points out, id. at 79–80, Lee and Penven provided yarn diameters and loop diameters that were conventional, and there is evidence of record that a person of ordinary skill in the art would have used these conventional diameters in constructing Sudre’s paper machine clothing. Ex. 1003 ¶¶ 258–261, 263–266; Ex. 1006, 3:64–66.” slip op. at 14
Claim construction§ 103 obviousnesscites Phillips · KSR · GrahamPatents in suitUS 11,261,566 - Texas Instruments Incorprated v. Parkervision, Inc.All claims unpatentablePTAB · Nov 21, 2025 · IPR2024-00934 · APJ Michael R Zecher · IPR · Final written decision
Claims 19–21 are unpatentable as obvious over DeMaw and, separately, over Macnally.
RulingsFinal written decision- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“1. Principles of Law A claim is unpatentable under § 103(a) if the differences between the” slip op. at 16
Patent outcomesUS 7,496,342 unpatentable§ 103 obviousnesscites KSR · GrahamPatents in suitUS 7,496,342 - PTAB · Nov 6, 2025 · PGR2025-00040 · APJ Kimberly Mcgraw · PGR · Institution
The Board instituted PGR on claims 1–9, 11–33, and 35–38 on all petition grounds, finding it more likely than not that Hassfjell-Hoff anticipates at least claim 1.
RulingsInstitution decision- PTAB / AIA Trials › Institution threshold (reasonable likelihood / more likely than not)InstitutedInstituted
“Under 35 U.S.C. § 324(a), a post-grant review may be instituted only if “the information presented in the petition . . . demonstrate[s] that it is more likely than not that at least 1 of the claims challenged in the petition is unpatentable.” Post-grant review is available for patents that issue from applications that at one point contained at least one claim with an effective filing date on or after March 16, 2013. See Leahy-Smith America Invents Act, Pub. L. No. 112-29, 125 Stat. 284 (2011) (“AIA”), §§ 3(n)(1), 6(f)(2)(A). After considering the briefing and the evidence of record, for the reasons set forth below, we determine that Petitioner has shown that the ’437 patent is eligible for post-grant review and that it is more likely than not that at least one challenged claim of the ’437 patent is unpatentable under § 324(a). Accordingly, we institute a post-grant review of all challenged claims of the ’437 patent.” slip op. at 2
- Adverse judgmentAdverse judgmentOther
“Here, Patentee Sciencons AS filed a statutory disclaimer of claims 10 and 34 of the ’437 patent. Ex. 2001; Prelim. Resp. 43. Based on our review of Exhibit 2001 and the Office’s public records, we find that the disclaimer of claims 10 and 34 complies with the above-listed requirements of 37 C.F.R. § 1.321(a). Accordingly, we treat claims 10 and 34 as having never been part of the ’437 patent. See Vectra Fitness, Inc. v. TNWK Corp., 162 F.3d 1379, 1383 (Fed. Cir. 1998) (“This court has interpreted the term ‘considered as part of the original patent’ in [35 U.S.C.] § 253 to mean that the patent is treated as though the disclaimed claims never existed.”). Because post-grant review cannot be instituted based on disclaimed claims, claims 10 and 34 are outside the scope of this proceeding. 37 C.F.R. § 42.207(e) (“No post-grant review will be instituted based on disclaimed claims.”); General Elec. Co. v. United Techs. Corp., IPR2017-00491, Paper 9 (PTAB July 6, 2017) (precedential) (denying institution in view of a statutory disclaimer of all the challenged claims). Thus, we confine our analysis in this Decision to claims 1–9, 11–33, and 35– 38, the remaining challenged claims that have not been disclaimed.” slip op. at 6
- PTAB / AIA Trials › Real party in interest / privityGranted
“Sciencons AS also states that ARTBIO, Inc. is responsible for defending the ’437 patent in this proceeding and requests that ARTBIO, Inc. be included in the caption for this proceeding.2 Paper 4, 1. ARTBIO, Inc. has signed powers of attorney appointing the same practitioners that were appointed by Sciencons AS to transact all business associated with the instant post-grant review review of the ’437 patent. See Paper 3. To date, no objection has been raised to Patent Owner’s request. Given Sciencons AS’s representation that ARTBIO, Inc. is currently the exclusive licensee of the ’437 patent and is responsible for defending the ’437 patent, we grant Sciencons AS’s unopposed request that ARTBIO, Inc. be included in the caption. For convenience we refer to Sciencons AS and the purported exclusive licensee ARTBIO, Inc. collectively as “Patent Owner.” As stated supra, to the extent any party disputes ARTBIO, Inc.’s right to participate in this proceeding or to be included in the caption, the party shall request authorization to brief the issue within 10 business days of this Decision.” slip op. at 3
- Skill levelSkill level petitioner adoptedDecided for petitioner
“nuclear chemistry, radiochemistry, or materials science, or a comparable field of study, plus approximately two to three years of professional experience with radioisotope generators, radiopharmaceutical chemistry, nuclear medicine, or other relevant industry experience” and that “[a]dditional graduate education could substitute for professional experience, and significant experience in the field could substitute for formal education.” Pet. 2–3 (citing Ex. 1002 ¶ 33; Ex. 1019 ¶ 27). At this stage of the proceeding, Patent Owner does not dispute Petitioner’s proposed definition nor provide a proposed definition of its own. See generally Prelim. Resp. For the purposes of this Decision, we adopt Petitioner’s undisputed proposed definition of a POSITA.” slip op. at 10
Claim construction§ 102 anticipation§ 103 obviousness§ 112 disclosurecites PhillipsPatents in suitUS 12,249,437 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.No claims unpatentablePTAB · Nov 5, 2025 · IPR2024-00792 · APJ Jo-Anne M Kokoski · IPR · Final written decision
Claims 1–6 were not shown unpatentable because the asserted references did not establish the claimed bias voltages and pre-verify stage.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedOther
“In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 5–6. Because Petitioner’s definition of the level of skill in the art is consistent with the ’957 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir. 2001).” slip op. at 6
- Expert testimonyPatent owner expert creditedOther
“It is within our discretion to assign the appropriate weight to Dr. Przybylski’s testimony. See, e.g., Yorkey v. Diab, 601 F.3d 1279, 1284 (Fed. Cir. 2010) (holding that the Board has discretion to give more weight to one item of evidence over another “unless no reasonable trier of fact could have done so”); In re Am. Acad. of Sci. Tech Ctr., 367 F.3d 1359, 1368 (Fed. Cir. 2004) (“[T]he Board is entitled to weigh the declaration and conclude that the lack of factual corroboration warrants discounting the opinions expressed in the declarations.”). On this record, we decline to generally discount Dr. Przybylski’s based on Petitioner’s contentions. When assigning upon which the testimony is based. See PTAB Consolidated Trial Practice Guide 40–41 (Nov. 2019). In our analysis of the asserted grounds of unpatentability, we weigh Dr. Przybylski’s testimony accordingly.” slip op. at 6
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“customary meaning of such claim as understood by one of ordinary skill in the art and the prosecution history pertaining to the patent.” 37 C.F.R. § 42.100(b). Under this standard, claim terms are generally given their plain and ordinary meaning as would have been understood by a person of ordinary skill in the art at the time of the invention and in the context of the entire patent disclosure. Phillips v. AWH Corp., 415 F.3d 1303, 1313 (Fed. Cir. 2005) (en banc). Only those terms in controversy need to be construed, and only to the extent necessary to resolve the controversy. Realtime Data, LLC v. Iancu, 912 F.3d 1368, 1375 (Fed. Cir. 2019). Based on our review of the complete trial record and the arguments raised by the parties, we determine that it is not necessary to expressly construe any claim terms to resolve the parties’ dispute. Realtime Data, 912 F.3d at 1375.” slip op. at 7
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)Not shown unpatentableNot shown unpatentable
“claim 1 would have been obvious over the combined teachings of Hongtao and Yu by a preponderance of the evidence. 35 U.S.C. § 316(e) (2018); see also Harmonic Inc. v. Avid Tech., Inc., 815 F.3d 1356, 1363 (Fed. Cir. 2016) (citing 35 U.S.C. § 312(a)(3) (requiring inter partes review petitions to identify “with particularity . . . the evidence that supports the grounds for the challenge to each claim”)). After considering the parties’ arguments and evidence of record, and weighing the testimony of Dr. Liu and Dr. Przybylski, we are not persuaded that Petitioner meets its burden of establishing, by a preponderance of the evidence, that Hongtao teaches or suggests applying a second bias voltage that is smaller than the first bias voltage in the verify stage as recited in limitation [1.d]. Hongtao is silent with respect to the magnitudes of the pre-conduction and conduction voltages. Hongtao teaches that “a pre-conduction voltage is applied to both the unselected word line and the selected word line to turn on the channels of the selected string and the unselected string.” Ex. 1005 ¶ 23. Hongtao then teaches that, in the reading phase, “[t]he gates of the unselected memory cells on the selected string are applied with a conduction voltage through the unselected word lines.” Id. ¶ 25. Hongtao, however, describes the magnitudes of the pre-conduction and conduction relative to each other. See id. ¶¶ 21–26. Petitioner and Dr. Liu point to Hongtao’s statement that “the greater the conduction voltage, the greater the read disturbance” to support its contention that the conduction voltage is smaller than the pre-conduction voltage, but that statement refers to the relationship between conduction voltage and the read interference it causes and does not compare the conduction voltage to the pre-conduction voltage. See Pet. 40 (citing Ex. 1005 ¶ 26); Ex. 1003 ¶ 120 (citing Ex. 1005 ¶ 26). We also find credible Dr. Przybylski’s testimony that Hongtao lacks the details needed to determine how the gate voltages develop over time, in particular the length of the pre-conduction period. See Ex. 2003 ¶ 96. Dr. Przybylski’s testimony is consistent with the ’957 patent’s teaching that when the pre-pulse time is long enough that the bias voltages are fully developed before the TSG transistor is switched off at the unselected memory cell string, hot carrier injection “may not be generated from the selected memory cell to the upper adjacent memory cell of the selected memory cell in the selected memory cell.” Ex. 1001, 11:60–12:1. In contrast, when the pre-pulse time is insufficient for the bias voltages to fully develop, hot carrier injection may be generated. Id. at 12:1–9. And we are not persuaded that Petitioner and Dr. Liu sufficiently rebut Dr. Przybylski’s persuasive testimony that casts doubt on Petitioner’s contention that Hongtao teaches a second bias voltage that is smaller than a first bias voltage as recited in limitation [1.d]. For example, Dr. Liu’s testimony that Hongtao teaches applying voltages on gate terminals does not adequately address Patent Owner’s argument and Dr. Przybylski’s testimony that Hongtao depicts target values for the word line voltages instead of the See Ex. 1027 ¶¶ 16–40. Neither Petitioner nor Dr. Liu adequately establish that Hongtao’s applied voltages are sufficiently developed such that the preconduction voltage actually is bigger than the conduction voltage. Petitioner’s argument that Hongtao teaches or discloses a second bias voltage that is smaller than the first bias voltage hinges on a POSITA’s interpretation of Hongtao’s Figure 2. In light of Hongtao’s dearth of details regarding the absolute or relative magnitudes of the pre-conduction and conduction voltages, and Dr. Przybylski’s unrebutted testimony that Hongtao does not provide sufficient information to ascertain the actual bias voltages that will be applied on the gate terminals of the memory cells over time, we are not persuaded that Petitioner carries its burden of establishing that Hongtao discloses limitation [1.d]. For these reasons, we determine that Petitioner does not establish by a preponderance of the evidence, that independent claim 1, and claims 2–6 that depend, directly or indirectly, therefrom, would have been obvious over the combined teachings of Hongtao and Yu.” slip op. at 15
Patent outcomesUS 11,468,957 not shown unpatentableClaim construction§ 102 anticipation§ 103 obviousnesscites PhillipsPatents in suitUS 11,468,957 - Exotec Product France SAS / Exotec North America Inc. et al. v. Opex CorporationAll claims unpatentablePTAB · Oct 28, 2025 · IPR2024-00850 · APJ Arthur M Peslak · IPR · Final written decision
Claims 1, 3–12, 14, and 23–27 are unpatentable as obvious over Raizer and Hangzhou.
RulingsFinal written decision- Skill levelOther
“B. Level of Ordinary Skill in the Art We consider the asserted grounds of unpatentability in view of the” slip op. at 9
- Claim Construction › Threshold & procedure › Whether a term needs construction (O2 Micro)No construction neededOther
“C. Claim Construction Neither Petitioner nor Patent Owner proposes an express construction” slip op. at 10
- Obviousness (§103) › Motivation to combine / reasonable expectation of successUnpatentableMotivation foundUnpatentable
“that it would improve similar devices in the same way, using the technique is obvious unless its actual application is beyond his or her skill.” KSR, 550 U.S. at 417. In this case, we must determine whether one of ordinary skill in the art would recognize that Hangzhou’s disclosure of driving its auto-guided trolleys 200 under shelves 100 would improve the operation of Raizer’s system in the same way. For us to resolve this question in Petitioner’s favor, Petitioner must provide “some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness.” Id. at 418 (citing In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006)). However, bodily incorporation, i.e., “an actual physical substitution of” Hangzhou’s auto-guided trolleys or operating software into Raizer’s system, is not required. See In re Mouttet, 686 F.3d 1322, 1332 (Fed. Cir. 2012) (“It is well-established that a determination of obviousness based on teachings from multiple references does not require an actual, physical substitution of elements.”); In re Nievelt, 482 F.2d 965, 968 (CCPA 1973) (“Combining the teachings of references does not involve an ability to combine their specific structures.”).” slip op. at 23
Patent outcomesUS 11,472,632 unpatentableClaim construction§ 103 obviousnesscites KSR · GrahamPatents in suitUS 11,472,632 - Micron Technology, Inc. v. Yangtze Memory Technologies Company, Ltd.Some claims unpatentablePTAB · Oct 23, 2025 · IPR2024-00790 · APJ Jo-Anne M Kokoski · IPR · Final written decision
Claims 1–3 are unpatentable as obvious over Kim; claims 4 and 5 were not shown unpatentable over the asserted grounds.
RulingsFinal written decision- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner
“SuperGuide, 358 F.3d at 875 (“We review the patent’s written description and drawings to confirm that the patentee’s own use of the disputed term is consistent with the meaning given to it by the court.”). The ’031 patent teaches that dielectric pairs of different tiers are etched to form staircases extending along the x-y plane. Ex. 1001, 13:27–28. As described above (§ I.D, supra), dielectric filling structure 311 is formed by depositing a dielectric filling material to fill the space remaining after portions of dielectric stack 203 are removed to form staircase structure 303. Id. at 13:36–41; see also id. at 22:63–65 (“Memory structure 1200 can be formed by forming dielectric filling structure 1201 to fill the space formed by the removal of portions of dielectric stack 1003.”) The ’031 patent then teaches that excess dielectric filling material overlying the topmost surface of staircase structure 303 is removed using a suitable planarization method. Id. at 13:41–44; see also 22:67–23:5 (performing a planarization process to remove excess dielectric filling structure 1201 over the top surface of memory structure 1200). According to the ’031 patent, the portion of the deposited dielectric filling material that remains “over staircase structure 303 and isolation layer 109” forms “dielectric filling structure 311 that surrounds staircase structure 303.” Id. at 13:44–48 (emphasis added); see also id. at 1:56–58 (stating in “some embodiments, the memory device also includes a filling structure surrounding the multiple-stack staircase structure”). structure is etched along the x-, y-, and z-axes, and the dielectric filling structure fills the spaces in the x-, y-, and z-directions created when the staircase structure is etched. Because the excess portion of the dielectric filling structure overlying the top of the staircase structure is removed, what remains is dielectric filling structure in the spaces around the staircase structure in the x-, y-, and z-planes. In this way, the ’031 patent teaches that the dielectric filling structure surrounds, i.e., is all around or encircles, the staircase structure.” slip op. at 11
- Skill levelSkill level petitioner adoptedDecided for petitioner
“(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices,” or “an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 22–23. Petitioner further contends that a “POSITA would have been aware of and generally knowledgeable about 3D NAND’s structure, its component parts, how it operates, and how it is controlled.” Id. at 23 (citing Ex. 1003 ¶¶ 41–44). Patent Owner states that it does not object to the definition of a POSITA proffered by Petitioner. PO Resp. 13–14 (citing Pet. 22). In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 7. Because Petitioner’s definition of the level of skill in the art is consistent with the ’031 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir 2001).” slip op. at 7
- Obviousness (§103) › Motivation to combine / reasonable expectation of successMotivation not foundMixed
“Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23
- Obviousness (§103) › Motivation to combine / reasonable expectation of success › HindsightNot shown unpatentableDecided for patent owner
“Dr. Banerjee adequately explains why a POSITA would have been motivated to make dummy structures DS with a conductive core as Petitioner proposes. In an obviousness analysis, some kind of reason must be shown as to why a POSITA would have thought of combining or modifying the prior art to achieve the patented invention. See Innogenetics, N.V. v. Abbott Labs., 512 F.3d 1363, 1374 (Fed. Cir. 2008). Here, Petitioner offers only the general proposition that pillar support structures comprising electrically conductive material were known in the art, but this does not provide a reason why a POSITA would have been motivated to modify Kim’s dummy structures. Pet. 55–56; Ex. 1003 ¶¶ 156–157. Petitioner’s arguments and Dr. Banerjee’s testimony with respect to the modification of Kim leaves an analytical gap that does not apprise us of why a POSITA would have modified Kim’s dummy structures to include a conductive core as the pillar-support material recited in claim 4. Instead, Petitioner attempts to imbue a POSITA with the knowledge of the claimed invention, when no prior art reference, references of record, or other evidence conveys or suggests that knowledge. Petitioner’s argument that a POSITA would have modified Kim in this way appears to be premised on Petitioner’s knowledge of the ’031 patent disclosure. This is improper hindsight reasoning. Petitioner needed to explain sufficiently what invention to consider modifying Kim’s dummy structures to include a conductive core. Petitioner fails to provide such an explanation. See W.L. Gore & Assoc., Inc. v. Garlock, Inc., 721 F.2d 1540, 1553 (Fed. Cir. 1983) (In an obviousness analysis, we must “cast the mind back to the time the invention was made” and “occupy the mind of one skilled in the art who is presented only with the references, and who is normally guided by the thenaccepted wisdom in the art.”).” slip op. at 23
Patent outcomesUS 10,868,031 mixedClaim construction§ 103 obviousnesscites PhillipsPatents in suitUS 10,868,031 - Micron Technology, Inc. v. Yangtze Memory Techonologies Company, Ltd.All claims unpatentablePTAB · Oct 23, 2025 · IPR2024-00789 · APJ Jo-Anne M Kokoski · IPR · Final written decision
Claims 1–6 and 11–13 are unpatentable as obvious over Tessariol; Petitioner did not show claims 1–6, 11, and 13 obvious over Park.
RulingsFinal written decision- Skill levelSkill level petitioner adoptedDecided for petitioner
“(“POSITA”) would have had “a bachelor of science degree in electrical engineering or a similar discipline” with “2–3 years of professional experience working with (e.g., researching, designing, or teaching) monolithic 3D structures and NAND memory devices,” or “an equivalent level of skill, knowledge, and experience (e.g., an advanced degree may replace some of the professional experience).” Pet. 33. Petitioner further contends that a “POSITA would have been aware of and generally knowledgeable about 3D NAND’s structure, how it is manufactured, and its component parts.” Id. (citing Ex. 1003 ¶¶ 40–43). Patent Owner states that it does not object to the definition of a POSITA proffered by Petitioner. PO Resp. 13 (citing Pet. 33). In the Institution Decision, we adopted the assessment offered by Petitioner. Dec. 5–6. Because Petitioner’s definition of the level of skill in the art is consistent with the ’872 patent and the asserted prior art, we maintain it for purposes of this Final Written Decision. See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir 2001).” slip op. at 6
- Claim Construction › Intrinsic evidence (Phillips canons) › Plain and ordinary meaning to a POSITATerm construed patent owner constructionDecided for patent owner
“Read as a whole, the Specification supports the conclusion that a “dummy source structure” does not function as a source for the memory cells. Dummy source structures are variously described as being (1) electrically separated from the conductive layers of the memory stack, (2) used to laterally separate 3D memory device 100 into multiple memory regions, (3) used as a mechanical support structure, and (4) used as an interconnect to peripheral devices. None of these functions are directed to sourcing the memory cells. Moreover, the Specification describes a “source structure” as being connected with a channel structure of a memory string via a common source, such as a doped region in the substrate. That a dummy source structure does not function as a source to the memory cells is consistent with this description of source structure.” slip op. at 11
- Obviousness (§103) › Graham factors (scope of art, differences, level of skill)UnpatentableUnpatentable
“After considering the complete record, we are persuaded that Petitioner sufficiently establishes that Tessariol teaches “at least two of the plurality of dummy source structures are of nominally equal lateral distances to the staircase contact” and “the plurality of dummy source structures are of nominally equal lateral distances to the staircase contact” as recited in claims 3 and 4. As an initial matter, we note that the ’872 patent defines “nominal/nominally” as follows: As used herein, the term “nominal/nominally” refers to a desired, or target, value of a characteristic or parameter for a component or a process operation, set during the design phase of a product or a process, together with a range of values above and/or below the desired value. The range of values can be due to slight variations in manufacturing, processes or tolerances. Ex. 1001, 4:9–15. Referring to Figure 1A, the ’872 patent also teaches that “[t]he four dummy source structures indicated by 146 may be spaced with nominally equal lateral distances to staircase contact 122. In other words, the four dummy source structures indicated by 146 may be evenly or Accordingly, we understand “nominally equal lateral distances” as used in claims 3 and 4 to include evenly or uniformly distributed structures. See Ex. 1003 ¶ 162 (Dr. Banerjee testifying that “[n]ominally lateral distances to, in the context of the ’872 Patent, includes being ‘evenly or uniformly distributed.’”). Tessariol’s Figure 15 illustrates that dummy structures 60 are evenly distributed around operating conductive vias 80. Ex. 1006, Fig. 15. The figure is consistent with Tessariol’s teaching that dummy-structure openings 56 (which become dummy structures 60) are “collectively arrayed in straight-line rows and columns” and “any alternate configuration may be used including, for example, staggering . . . alternating openings 54/56 in rows and/or columns.” Id. ¶ 37. We also credit Dr. Banerjee’s testimony that “it is best practice to use repeating patterns in semiconductive designs” and “a POSITA viewing the Tessariol figures would immediately interpret the figures to include this repeating pattern, in which these objects are of equal distance from the contact.” Ex. 1035 ¶ 85. We disagree with Patent Owner that Tessariol’s Figure 15 is insufficient to show that the dummy source structures are of nominally equal lateral distances to the staircase contact. The Federal Circuit has held that “the speculative modeling premised on unstated assumptions in prior art patent drawings cannot be the basis for challenging the validity of claims reciting specific dimensions not disclosed directly in such prior art.” Nystrom v. TREX Co., 424 F.3d 1136, 1148 (Fed. Cir. 2005) (emphasis added). Here, claims 3 and 4 recite relative positioning (“nominally equal lateral distances”), not specific dimensions or proportions. Accordingly, we find Petitioner’s reliance on Tessariol’s Figure 15 to establish the placement particularly given Dr. Banerjee’s credible testimony regarding best practices in semiconductor design and that a POSITA viewing the Tessariol figures would have understood the objects are of equal distance from the contact. See Ex. 1035 ¶ 85. Based on our consideration of the entire record, and for the reasons set forth above, we determine that Petitioner shows, by a preponderance of the evidence, that claims 3 and 4 would have been obvious over the teachings of Tessariol.” slip op. at 27
- Expert testimonyPetitioner expert discountedDecided for patent owner
“Petitioner’s and Dr. Banerjee’s arguments are not persuasive. The arguments are circular as they assert that a POSITA would have understood that dummy source structure must have a complete path (i.e., not have a partial path, or dead-end) like a source structure because the source structure must have a complete path. See, e.g., Ex. 1035 ¶ 50. Similarly, the argument that the ’872 patent’s use of “connect” can only refer to an electrical connection between dummy source structure 246 and the channel structures is based on a figure depicting a source line as having an electrical connection and Dr. Banerjee’s unsupported assertion that the source line is a dummy source line (in some embodiments). Pet. Reply 9; Ex. 1035 ¶ 50. Again, Dr. Banerjee’s evidence is circular as it asserts the dummy source structure must have a complete path because the figure depicts a source line having a complete path, and therefore dummy source lines (in some embodiments) must have a complete path. Id. To the extent Dr. Banerjee asserts that it was “well known” that dummy source structures function as sources or source structures, any such assertion is not credible in light of his testimony that he had never heard of dummy source structures. See Ex. 1035 ¶¶ 17 (stating he “never heard of ‘dummy source structure’ before reading the ’872 patent”), 50 (stating “how these dummy source and source structures function as sources . . . was well known”). Thus, Petitioner’s assertion that the ’872 patent teaches a dummy source structure may connect to channel structures in the inner region is insufficient to show that the dummy source structure acts as a source to the memory cells.” slip op. at 14
Patent outcomesUS 10,861,872 unpatentableClaim construction§ 103 obviousnesscites PhillipsPatents in suitUS 10,861,872
Holdings, summaries, rulings, issues, outcomes, winners and claim constructions shown for a decision were generated by a large language model reading the opinion. They are a guide to the decision, not the decision. Confirm every one against the court's own text before relying on it. Outcomes read from the patent owner’s side. Party names are extracted from the decision and are missing on about 900 short Director denials and scans, which carry the trial number instead.